Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Akihito Shinozaki"'
Publikováno v:
Analytical sciences : the international journal of the Japan Society for Analytical Chemistry. 35(9)
Polyhexamethylene biguanide (PHMB) is a cationic disinfectant widely used for personal-care products and for sanitizers in swimming pools. This paper describes a promotion effect of PHMB on a glucose oxidase (GOx) enzymatic reaction with ferricyanide
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::977164a591fe785db603fc4cb018626e
https://pubmed.ncbi.nlm.nih.gov/31130579
https://pubmed.ncbi.nlm.nih.gov/31130579
Autor:
Mizuho Morita, Kazuo Nishimura, Tatsuya Okazaki, Akihito Shinozaki, Shinichi Urabe, Yuuki Morita, Satoru Morita
Publikováno v:
Japanese Journal of Applied Physics. 43:7857-7860
Tunneling current through ultrathin silicon dioxide films with a thickness of approximately 3.1 nm, formed on n-Si (100) by controlling preoxide growth during heating, is examined using Al/oxide/n-Si structures. Electron tunneling current through the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0b7d91782e013205a432fd8540e8a228
https://doi.org/10.1143/jjap.43.7857
https://doi.org/10.1143/jjap.43.7857
Autor:
Mizuho Morita, Motonori Chikamoto, Junichi Uchikoshi, Kenta Arima, Akihito Shinozaki, Satoru Morita, Kosuke Horikoshi, Hideaki Hashimoto
Publikováno v:
Extended Abstracts of the 2005 International Conference on Solid State Devices and Materials.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::61839bde67a52a638e7f4906463f4094
https://doi.org/10.7567/ssdm.2005.p7-14
https://doi.org/10.7567/ssdm.2005.p7-14
Publikováno v:
Analytical sciences : the international journal of the Japan Society for Analytical Chemistry. 19(11)
The effectiveness of cleaning organic contaminants from silicon dioxide (SiO2) surfaces was studied by conducting highly sensitive measurements using Fourier Transform Infrared Attenuated Total reflectance (FTIR-ATR) with a Si prism as the waveguide.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2ac4f9df57f09229d6e14f19fb67e3d7
https://pubmed.ncbi.nlm.nih.gov/14640459
https://pubmed.ncbi.nlm.nih.gov/14640459
Publikováno v:
ResearcherID
Grazing incidence X‐ray reflectivity (GIXR), ellipsometry and X‐ray photoelectron spectroscopy (XPS) have been used for measuring the thickness of ultrathin SiO2 films on Si(100). SiO2 films were fabricated at a constant temperature to obtain a f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c69eaf28982f11fec9a00020485af46c
https://doi.org/10.1063/1.1622492
https://doi.org/10.1063/1.1622492
Publikováno v:
Extended Abstracts of International Workshop on Gate Insulator (IEEE Cat. No.03EX765).
In this study, we have examined a way to determine the barrier height of ultra-thin SiO/sub 2/ films by current density-oxide voltage characteristics of MOS diode using different metal gates.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5d4b5a2b47bc341f5bfa73d3e6a84ba9
https://doi.org/10.1109/iwgi.2003.159193
https://doi.org/10.1109/iwgi.2003.159193
Autor:
Mizuho Morita, Motonori Chikamoto, Hideaki Hashimoto, Kosuke Horikoshi, Akihito Shinozaki, Satoru Morita, Kenta Arima, Junichi Uchikoshi
Publikováno v:
ECS Meeting Abstracts. :733-733
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::40939d9f4291b194833ca337ea83614a
https://doi.org/10.1149/ma2005-02/19/733
https://doi.org/10.1149/ma2005-02/19/733