Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Akihito Anpo"'
Autor:
Takahito Nakayama, Noriaki Nakayamada, Kenji Ohtoshi, Victor Katsap, Rodney A. Kendall, Hidekazu Takekoshi, Seiichi Nakazawa, Hiroyoshi Ando, Kenichi Saito, Hideo Inoue, Tomohiro Iijima, Akihito Anpo, Yoshinori Kojima, Hirohito Anze, Rieko Nishimura, Takashi Kamikubo, Steven D. Golladay, Jun Yashima
Publikováno v:
SPIE Proceedings.
Many lithography candidates, such as ArF immersion lithography with double-patterning/double-exposure techniques, EUV lithography and nano-imprint lithography, show promising capability for 22-nm half-pitch generation lithography. ArF immersion litho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8d42d9388e3cf893d9c60ad2918c5138
https://doi.org/10.1117/12.2065551
https://doi.org/10.1117/12.2065551
