Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Akihiro, Konda"'
Publikováno v:
Journal of Photopolymer Science and Technology. 35:1-7
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f81a35600f3b3865108733ab2882cc5
https://doi.org/10.2494/photopolymer.35.1
https://doi.org/10.2494/photopolymer.35.1
Publikováno v:
Advances in Patterning Materials and Processes XL.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f1c3620078dca71924dea9917093471d
https://doi.org/10.1117/12.2657889
https://doi.org/10.1117/12.2657889
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
Electron beam (EB) lithography is indispensable for the fabrication of photomasks including extreme ultraviolet masks. With the miniaturization of electronic devices, the requirement for photomasks becomes severe. When the feature size was decreased,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f7b1381b8bdcfeb8e97132d6fcd64087
https://doi.org/10.1117/12.2584016
https://doi.org/10.1117/12.2584016
Autor:
Kazumasa Okamoto, Akihiro Konda, Yuki Ishimaru, Takahiro Kozawa, Yasunobu Nakagawa, Masamichi Nishimura
Publikováno v:
Japanese Journal of Applied Physics. 61:066505
The demand for improved performance of chemically amplified resists (CARs) is continually increasing with the development of extreme ultraviolet lithography. Acid-generation promoters (AGPs) increase the sensitivity of CARs by increasing the initial
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6848dbd73e53258dfaaa334b876a2d2b
https://doi.org/10.35848/1347-4065/ac67ba
https://doi.org/10.35848/1347-4065/ac67ba
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
The photo-mask in lithographic process of semiconductor device has an important role to transfer the downsized target image to the wafer. Due to the development of information society, demand for semiconductor devices has been growing. In order to in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::27fa29b4feff78f780d472bda2bb14fc
https://doi.org/10.1117/12.2551825
https://doi.org/10.1117/12.2551825
Autor:
Koki Ueno, Kazumasa Okamoto, Yuichi Inubushi, Takahiro Kozawa, Shunpei Kawai, Akira Kon, Hiroo Kinoshita, Shigeki Owada, Yuta Ikari, Thanh-Hung Dinh, Yohei Arai, Masahiko Ishino, Akihiro Konda, Masaharu Nishikino, Shigeo Hori
Publikováno v:
Applied Physics Express. 14:066502
Efforts are being focused on increasing the power of extreme ultraviolet (EUV) light sources used in semiconductor manufacturing to increase the throughput. As a result, the investigation of the effect of high power sources on resist materials is a c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9effc818f8e5b6eaa00f2d4935e71be
https://doi.org/10.35848/1882-0786/abfca3
https://doi.org/10.35848/1882-0786/abfca3
Autor:
Kazumasa, Okamoto, Shunpei, Kawai, Yuta, Ikari, Shigeo, Hori, Akihiro, Konda, Koki, Ueno, Yohei, Arai, Masahiko, Ishino, Dinh, Thanhhung, Masaharu, Nishikino, Akira, Kon, Shigeki, Owada, Yuichi, Inubushi, Hiroo, Kinoshita, Takahiro, Kozawa
Publikováno v:
Applied Physics Express. 14:066502
Efforts are being focused on increasing the power of EUV light sources used in semiconductor manufacturing to increase the throughput. As a result, the investigation of the effect of high power sources on resist materials is a critical issue. A chemi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=jairo_______::4409df2361d3c0c2c3dfec59ddde7569
https://repo.qst.go.jp/records/82819
https://repo.qst.go.jp/records/82819
Publikováno v:
Japanese Journal of Applied Physics. 59:086506
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8699e4eff29d028460e8328c1aa99cc
https://doi.org/10.35848/1347-4065/aba7d7
https://doi.org/10.35848/1347-4065/aba7d7
Publikováno v:
Japanese Journal of Applied Physics. 59:086501
The transistors have been miniaturized to increase their integration. With the miniaturization, the thickness of resist has been decreased to prevent them from collapsing. In this study, the resist thickness dependence of the pattern formation of a c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6bb5d11564ee226aa24557e0a324e604
https://doi.org/10.35848/1347-4065/ab9fde
https://doi.org/10.35848/1347-4065/ab9fde
Autor:
Kenji Urayama, Kohzo Ito, Akihiro Konda, Toshikazu Takigawa, Masatoshi Kidowaki, Chikara Katsuno
Publikováno v:
Advanced Materials. 25:4636-4640
Polymer membranes comprising slide-ring gels with movable cross-links exhibit a nonlinear pressure-dependence in the fluidic flow rate. The proportional constant between the flow rate and pressure significantly changes at a critical pressure. The sli
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::aa037209032b58856c5dbaa228e43bc8
https://doi.org/10.1002/adma.201301252
https://doi.org/10.1002/adma.201301252