Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Akella SH"'
Autor:
Vangapally N; Department of Chemistry and Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, INIES - Israel National Institute for Energy Storage, Ramat-Gan, 5290002, Israel., Lusztig D; Department of Chemistry and Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, INIES - Israel National Institute for Energy Storage, Ramat-Gan, 5290002, Israel., Rathod S; Department of Chemistry and Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, INIES - Israel National Institute for Energy Storage, Ramat-Gan, 5290002, Israel., Bano A; Department of Chemistry and Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, INIES - Israel National Institute for Energy Storage, Ramat-Gan, 5290002, Israel., Scalar H; Department of Chemistry and Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, INIES - Israel National Institute for Energy Storage, Ramat-Gan, 5290002, Israel., Akella SH; Department of Chemistry and Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, INIES - Israel National Institute for Energy Storage, Ramat-Gan, 5290002, Israel., Noked M; Department of Chemistry and Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, INIES - Israel National Institute for Energy Storage, Ramat-Gan, 5290002, Israel., Major DT; Department of Chemistry and Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, INIES - Israel National Institute for Energy Storage, Ramat-Gan, 5290002, Israel., Halalay IC; Battery Cell Systems Research Lab, General Motors, Warren, Michigan, MI 48092, USA., Sriramulu S; Orbia Fluorinated Solutions (Koura), Mexico, MA 0251, USA., Luski S; Department of Chemistry and Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, INIES - Israel National Institute for Energy Storage, Ramat-Gan, 5290002, Israel., Aurbach D; Department of Chemistry and Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, INIES - Israel National Institute for Energy Storage, Ramat-Gan, 5290002, Israel.
Publikováno v:
Small (Weinheim an der Bergstrasse, Germany) [Small] 2024 Oct; Vol. 20 (43), pp. e2403694. Date of Electronic Publication: 2024 Jun 25.
Autor:
Wang L; Department of Chemistry and Bar-Ilan Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat Gan, Israel.; Department of Materials, University of Oxford, Oxford, UK., Mukherjee A; Department of Chemistry and Bar-Ilan Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat Gan, Israel.; CSIR-Institute of Minerals and Materials Technology, Bhubaneswar, India., Kuo CY; National Synchrotron Radiation Research Center, Hsinchu, Taiwan, Republic of China.; Department of Electrophysics, National Yang Ming Chiao Tung University, Hsinchu, Taiwan, Republic of China., Chakrabarty S; Department of Chemistry and Bar-Ilan Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat Gan, Israel., Yemini R; Department of Chemistry and Bar-Ilan Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat Gan, Israel., Dameron AA; Forge Nano Inc, Thornton, CO, USA., DuMont JW; Forge Nano Inc, Thornton, CO, USA., Akella SH; Department of Chemistry and Bar-Ilan Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat Gan, Israel., Saha A; Department of Chemistry and Bar-Ilan Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat Gan, Israel., Taragin S; Department of Chemistry and Bar-Ilan Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat Gan, Israel., Aviv H; Department of Chemistry and Bar-Ilan Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat Gan, Israel., Naveh D; Department of Chemistry and Bar-Ilan Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat Gan, Israel., Sharon D; Institute of Chemistry, The Hebrew University of Jerusalem, Jerusalem, Israel., Chan TS; National Synchrotron Radiation Research Center, Hsinchu, Taiwan, Republic of China., Lin HJ; National Synchrotron Radiation Research Center, Hsinchu, Taiwan, Republic of China., Lee JF; National Synchrotron Radiation Research Center, Hsinchu, Taiwan, Republic of China., Chen CT; National Synchrotron Radiation Research Center, Hsinchu, Taiwan, Republic of China., Liu B; Department of Materials, University of Oxford, Oxford, UK., Gao X; Department of Materials, University of Oxford, Oxford, UK., Basu S; Department of Chemical Engineering, Indian Institute of Technology Delhi, Delhi, India., Hu Z; Max Planck Institute for Chemical Physics of Solids, Dresden, Germany. Zhiwei.Hu@cpfs.mpg.de., Aurbach D; Department of Chemistry and Bar-Ilan Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat Gan, Israel. Doron.Aurbach@biu.ac.il., Bruce PG; Department of Materials, University of Oxford, Oxford, UK., Noked M; Department of Chemistry and Bar-Ilan Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat Gan, Israel. Malachi.Noked@biu.ac.il.
Publikováno v:
Nature nanotechnology [Nat Nanotechnol] 2024 Feb; Vol. 19 (2), pp. 208-218. Date of Electronic Publication: 2023 Oct 05.
Autor:
Joshi A; Department of Chemistry, Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, Ramat Gan, 5290002, Israel., Chakrabarty S; Department of Chemistry, Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, Ramat Gan, 5290002, Israel., Akella SH; Department of Chemistry, Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, Ramat Gan, 5290002, Israel., Saha A; Department of Chemistry, Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, Ramat Gan, 5290002, Israel., Mukherjee A; Department of Hydro and Electro Metallurgy, CSIR-Institute of Minerals and Materials Technology Bhubaneswar, Bhubaneswar, Odisha, 751013, India., Schmerling B; Department of Chemistry, Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, Ramat Gan, 5290002, Israel., Ejgenberg M; Department of Chemistry, Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, Ramat Gan, 5290002, Israel., Sharma R; Department of Chemistry, Indian Institute of Technology (Banaras Hindu University), Varanasi, 221005, India., Noked M; Department of Chemistry, Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, Ramat Gan, 5290002, Israel.
Publikováno v:
Advanced materials (Deerfield Beach, Fla.) [Adv Mater] 2023 Dec; Vol. 35 (51), pp. e2304440. Date of Electronic Publication: 2023 Nov 12.
Autor:
Akella SH; Department of Chemistry, Bar-Ilan University, Ramat Gan 529002, Israel.; Bar-Ilan Institute of Nanotechnology and Advanced Materials, Ramat Gan 529002, Israel., Taragin S; Department of Chemistry, Bar-Ilan University, Ramat Gan 529002, Israel.; Bar-Ilan Institute of Nanotechnology and Advanced Materials, Ramat Gan 529002, Israel., Wang Y; Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20740 United States., Aviv H; Department of Chemistry, Bar-Ilan University, Ramat Gan 529002, Israel.; Bar-Ilan Institute of Nanotechnology and Advanced Materials, Ramat Gan 529002, Israel., Kozen AC; Department of Materials Science & Engineering, University of Maryland, College Park, Maryland 20740 United States., Zysler M; Department of Chemistry, Bar-Ilan University, Ramat Gan 529002, Israel.; Bar-Ilan Institute of Nanotechnology and Advanced Materials, Ramat Gan 529002, Israel., Wang L; Department of Chemistry, Bar-Ilan University, Ramat Gan 529002, Israel.; Bar-Ilan Institute of Nanotechnology and Advanced Materials, Ramat Gan 529002, Israel., Sharon D; The Institute of Chemistry, The Hebrew University of Jerusalem, Jerusalem 9190401, Israel., Lee SB; Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20740 United States., Noked M; Department of Chemistry, Bar-Ilan University, Ramat Gan 529002, Israel.; Bar-Ilan Institute of Nanotechnology and Advanced Materials, Ramat Gan 529002, Israel.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2021 Dec 29; Vol. 13 (51), pp. 61733-61741. Date of Electronic Publication: 2021 Dec 14.
Autor:
Akella SH; Material Science and Technology, Innovation Center, Tata Chemicals Limited, Pune, India., D E; Material Science and Technology, Innovation Center, Tata Chemicals Limited, Pune, India., R S SS; Material Science and Technology, Innovation Center, Tata Chemicals Limited, Pune, India., Ahire A; Material Science and Technology, Innovation Center, Tata Chemicals Limited, Pune, India., Mal NK; Material Science and Technology, Innovation Center, Tata Chemicals Limited, Pune, India. nmmal@tatachemicals.com.
Publikováno v:
Scientific reports [Sci Rep] 2018 Aug 14; Vol. 8 (1), pp. 12082. Date of Electronic Publication: 2018 Aug 14.