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pro vyhledávání: '"Ahmad Hafiz Jafarul Tarek"'
Publikováno v:
Current Nanoscience. 18:347-366
Abstract: Physical vapor deposition (PVD) is a thin film fabrication process in the semiconductor industry. This review paper discusses the different types of PVD methods such as sputtering, cathodic arc deposition, pulsed laser deposition, and ion p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95181e7686c35bc183aa1767008cad2b
https://doi.org/10.2174/1573413717666210809105952
https://doi.org/10.2174/1573413717666210809105952
