Feature Selection for Virtual Metrology Modeling: An application to Chemical Mechanical Polishing

Autor: Oussama Djedidi, Rebecca Clain, Valeria Borodin, Agnes Roussy

Publikováno v: 2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::544c369cd994a7fb2d374129b6cd3e17
https://doi.org/10.1109/asmc54647.2022.9792527

Out-Of-Control Detection In Semiconductor Manufacturing using One-Class Support Vector Machines

Autor: Cyril Alegret, Agnes Roussy, Francois Pasqualini, Ilham Rabhi

Publikováno v: CASE

Semiconductor manufacturing is a continuously challenging and competitive industry. It is important to detect any anomalies in the production facilities, or fabs, as they occur to avoid defect accumulations and loss of performance. In this paper we p

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::39861932b3d8aa9222457864fcd6e8ab
https://doi.org/10.1109/case49439.2021.9551477

A hybrid feature selection approach for virtual metrology: Application to CMP process

Autor: Agnes Roussy, Valeria Borodin, Michel Juge, Taki Eddine Korabi

Publikováno v: 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

This paper presents a feature selection method for virtual metrology applied to a chemical mechanical planarization process in the semiconductor industry. The proposed approach is based on a filter method coupled with a wrapper method. The goal of th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::029b61d89b5387deb4b7f07afdf87620
https://doi.org/10.1109/asmc51741.2021.9435673

A Structure Data-Driven Framework for Virtual Metrology Modeling

Autor: Jakey Blue, Agnes Roussy, Wei-Ting Yang, Marco S. Reis, Jacques Pinaton

Publikováno v: IEEE Transactions on Automation Science and Engineering
IEEE Transactions on Automation Science and Engineering, Institute of Electrical and Electronics Engineers, 2019, pp.1-10. ⟨10.1109/TASE.2019.2941047⟩

Virtual metrology (VM) has been widely studied in the semiconductor industry with the purpose of decreasing the cycle time and reducing the expensive metrology measurements. Ideally, a VM model should not only be able to provide accurate predictions

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4b28e275c7fda6c8a435a1151143c645
https://hal-emse.ccsd.cnrs.fr/emse-02499670

A physics-informed Run-to-Run control framework for semiconductor manufacturing

Autor: Agnes Roussy, Jacques Pinaton, Wei-Ting Yang, Marco S. Reis, Jakey Blue

Publikováno v: Expert Systems with Applications
Expert Systems with Applications, Elsevier, 2020, 155, pp.113424. ⟨10.1016/j.eswa.2020.113424⟩

For decades, Run-to-Run (R2R) controllers have been widely implemented in semiconductor manufacturing. They operate over key process parameters on the basis of the metrological measurements acquired from the process and their deviations from the targ

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c6834f9ea0228798842eb24cfa81626a
https://doi.org/10.1016/j.eswa.2020.113424