Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Ady Levy"'
Quantifying imaging performance bounds of extreme dipole illumination in high NA optical lithography
Publikováno v:
SPIE Proceedings.
We present a framework to analyze the performance of optical imaging in a hyper numerical aperture (NA) immersion lithography scanner. We investigate the method to quantify imaging performance by computing upperand lower-bounds on the threshold norma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7e057f8c6b7d71fe340f72e6900d6676
https://doi.org/10.1117/12.2240904
https://doi.org/10.1117/12.2240904
Autor:
Dongsub Choi, Myungjun Lee, Zephyr Liu, Vladimir Levinski, Michael E. Adel, Tal Itzkovich, Sangjun Han, Mi-Rim Jung, Young-Sik Kim, Kangsan Lee, Mark D. Smith, Ady Levy, Dohwa Lee, Honggoo Lee, Joonseuk Lee
Publikováno v:
SPIE Proceedings.
We present a metrology target design (MTD) framework based on co-optimizing lithography and metrology performance. The overlay metrology performance is strongly related to the target design and optimizing the target under different process variations
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e44c54bc168e356e764d66526b929b5c
https://doi.org/10.1117/12.2218653
https://doi.org/10.1117/12.2218653
Publikováno v:
SPIE Proceedings.
We present a cost-effective focus monitoring technique based on the illumination and the target co-optimization. An advanced immersion scanner can provide the freeform illumination that enables the use of any kind of custom source shape by using a pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e4143312a1f1f6e08b0dae7003ebd21
https://doi.org/10.1117/12.2218647
https://doi.org/10.1117/12.2218647
Autor:
Hsueh-Jen Tsai, Chia-Hung Chen, Myungjun Lee, Kuo-Yao Chou, Mark D. Smith, Jo-Lan Chin, Jen-Chou Huang, Hao-Lun Huang, Chen Dror, Healthy Huang, Jui-Chin Yang, Yuan-Ku Lan, Michael E. Adel, Harvey Cheng, Jinyan Song, Tal Itzkovich, Ady Levy, Yaniv Abramovitz, Chin-Chang Huang, I-Lin Wang, Hsien-Yen Lung
Publikováno v:
SPIE Proceedings.
We present a novel metrology target design framework using the scanner exit pupil wavefront analysis together with Zernike sensitivity analysis (ZSA) based on the Monte-Carlo technique. The proposed method enables the design of robust metrology targe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f7fce7d6ac86885d3ff9888443f23af9
https://doi.org/10.1117/12.2218659
https://doi.org/10.1117/12.2218659
Autor:
Kangsan Lee, David Tien, MinGyu Kim, Bill Pierson, Dongsub Choi, JawWuk Ju, Mark D. Smith, Ady Levy, John C. Robinson, Sanghuck Jeon, Stuart Sherwin, Dohwa Lee, JuHan Lee, George Hoo
Publikováno v:
SPIE Proceedings.
Feedback control of overlay errors to the scanner is a well-established technique in semiconductor manufacturing [1]. Typically, overlay errors are measured, and then modeled by least-squares fitting to an overlay model. Overlay models are typically
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f234c692b26c44b0fc3ad25074f8eb5c
https://doi.org/10.1117/12.2085074
https://doi.org/10.1117/12.2085074
Autor:
Nabil M. Amer, Ady Levy
Publikováno v:
Applied Physics Letters. 66:3594-3596
Picosecond photothermal displacement experiments were performed to resolve the rise time of the actual surface expansion of laser‐illuminated metals. A rise time of ∼100 ps was resolved for Ni, in agreement with the predictions of a hydrodynamic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30804c7b66ecc44ce4628df4a7a36f9e
https://doi.org/10.1063/1.113798
https://doi.org/10.1063/1.113798
Publikováno v:
2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203).
Spectroscopic CD (SCD) technology provides high precision shape information with excellent correlation to established critical dimension metrology. Poly-gate wafers from over 20 lots produced in a high-volume manufacturing fab were measured and analy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1fdbf662b6087063b75bd296f4107023
https://doi.org/10.1109/issm.2001.962934
https://doi.org/10.1109/issm.2001.962934
Publikováno v:
SPIE Proceedings.
The accelerating trend to smaller linewidths and low-kl lithography makes metrology and process control more challenging with each succeeding technology generation. Optical CD metrology based on spectroscopic ellipsometry provides higher precision, i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::88eba50752074eac5f26c58a47b553f5
https://doi.org/10.1117/12.473424
https://doi.org/10.1117/12.473424
Autor:
Xuemei Chen, Ady Levy, Michael D. Slessor, Georges Falessi, Amir Lev, Matt Hankinson, Kevin M. Monahan, Craig Garvin
Publikováno v:
SPIE Proceedings.
Fundamentally, advanced process control enables accelerated design-rule reduction, but simple microeconomic models that directly link the effects of advanced process control to profitability are rare or non-existent. In this work, we derive these lin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b786a32439adf55fa45114ab1e5a4422
https://doi.org/10.1117/12.473503
https://doi.org/10.1117/12.473503
Autor:
John A. Allgair, Lloyd C. Litt, Umar K. Whitney, Mark Drew, Pedro Herrera, Ady Levy, Robert R. Hershey, David C. Benoit, Suresh Lakkapragada, Marco Guevremont
Publikováno v:
SPIE Proceedings.
Smaller device dimensions and tighter process control windows have created a need for CD metrology tools having higher levels of precision and accuracy. Furthermore, the need to detect and measure changes in feature profiles is becoming critical to i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::49ea37cdec4055159bbb39d8cabe0733
https://doi.org/10.1117/12.436771
https://doi.org/10.1117/12.436771