Zobrazeno 1 - 10
of 45
pro vyhledávání: '"Adrien Danel"'
Publikováno v:
Journal of Telecommunications and Information Technology, Iss 1 (2005)
A 2 orders of magnitude range of van der Waals interactions is considered here to take the majority of the variety of shapes and materials of actual particles into account. Comparing these interactions with the repulsive forces generated by electrost
Externí odkaz:
https://doaj.org/article/5845ba34627f4f369a718f117bf327e9
Autor:
Adrien Danel, Nicolas Chaugier, Jordi Veirman, Renaud Varache, Mickael Albaric, Etienne Pihan
Publikováno v:
Progress in Photovoltaics: Research and Applications.
Publikováno v:
35th EUPVSEC
Silicon heterojunction (SHJ) solar cells, the transparent conductive oxide (TCO) layers used are designed to balance resistive losses and parasitic light absorption. This paper aims to determine the rear TCO optimization that can be made in the case
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b305e7029061f44b2d70511a47ca2d7a
https://doi.org/10.5281/zenodo.1744934
https://doi.org/10.5281/zenodo.1744934
Publikováno v:
Solid State Phenomena. 187:345-348
Amorphous/crystalline silicon heterojunction solar cells are commonly made by low temperature deposition of front and back side thin films on bare H-passivated Si wafers, obtained by HF last processes. This work discusses the impact of HF last step p
Publikováno v:
ECS Transactions. 25:139-146
The HCl absorption and release by FOUP polymers was characterized through the determination of its solubility and diffusion coefficients in PC and PEEK in clean room conditions (21{degree sign}C and 40% humidity). For the first time, HCl diffusion co
Publikováno v:
ECS Transactions. 25:79-86
The volatile acids impact on the via resistance of a Cu interconnect base structure was investigated by the intentional Cu-surfaces contamination with HF or HCl at a sensitive process step. The wafers acid contamination was performed from polluted FO
Publikováno v:
Microelectronic Engineering. 86:186-191
The sensitivity of the ChemetriQ^(R) method toward various contaminants was evaluated. Offering high resolution mapping without edge exclusion, the method based on surface work function lateral non-uniformities, i.e. the so called surface potential d
Publikováno v:
Solid State Phenomena. :143-146
Today, the use of Pods or FOUPs (Front Opening Universal Pod) in IC manufacturing leads to specific molecular contamination issues related to the enclosed environment made with porous polymers (mainly PEEK, PC and PP) that constitute these containers
Publikováno v:
Solid State Phenomena. :109-112
The monitoring and optimization of wet clean and surface preparation processes is a major challenge in the microelectronics industry [1, 2]. Today, the main methods used in clean rooms are visual inspection by light scattering (principally applied to
Autor:
Hiroshi Kohno, Marc Veillerot, Thierry Lardin, Adrien Danel, Dominique Despois, Charles Geoffroy, Motoyuki Yamagami, Nicolas Cabuil
Publikováno v:
Spectrochimica Acta Part B: Atomic Spectroscopy. 63:1375-1381
The issues related to the matching between the 3 modes of Total-reflection X-Ray Fluorescence available on the latest generation of commercial equipment: Direct-Total-reflection X-Ray Fluorescence, Sweeping-Total-reflection X-Ray Fluorescence and Vap