Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Adam Pranda"'
Publikováno v:
Journal of Vacuum Science & Technology A. 39:043001
Maintaining uniform sample etching during a plasma process is a critical requirement for applications in large-scale wafer processing. The interface between the plasma and the sample surface is defined by the plasma sheath, which accelerates ions tow
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::81208029e60997c08611f93689566e14
https://doi.org/10.1116/6.0001015
https://doi.org/10.1116/6.0001015
Autor:
John E. Petersen, Nikolaos Liaros, Sandra A. Gutierrez Razo, John T. Fourkas, Gottlieb S. Oehrlein, Adam Pranda
Publikováno v:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019.
Three-color lithography (3CL) produces features on the scale of tens of nanometers using visible light. In this technique, one beam pre-activates a photoresist, a second beam deactivates it, and a third beam activates the pre-activated regions that h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0e5db020f90e6a04f0964529a719b178
https://doi.org/10.1117/12.2516544
https://doi.org/10.1117/12.2516544
Autor:
Gottlieb S. Oehrlein, Robert L. Bruce, Eric A. Joseph, Sebastian Engelmann, Adam Pranda, Dominik Metzler, Kang-Yi Lin
Publikováno v:
Journal of Vacuum Science & Technology A. 38:052601
Extreme ultraviolet (EUV) lithography has emerged as the next generational step in advancing the manufacturing of increasingly complex semiconductor devices. The commercial viability of this new lithographic technique requires compatible photoresist
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d085e407850b2c1241a2da638dee1bff
https://doi.org/10.1116/6.0000289
https://doi.org/10.1116/6.0000289
Autor:
Daniel E. Falvey, Adam Pranda, Hannah M. Ogden, John T. Fourkas, Zuleykhan Tomova, Gottlieb S. Oehrlein, Matthew D. Thum, Amy S. Mullin, Nikolaos Liaros, Samuel R. Cohen, Sandra A. Gutierrez Razo, John S. Petersen, Steven M. Wolf
Publikováno v:
Novel Patterning Technologies 2018.
Multicolor photolithography using visible light holds the promise of achieving wafer-scale patterning at pitches on the 10 nm scale. Although substantial progress has been made on multicolor techniques, a number of challenges remain to be met before
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e4311521fb7b458c8a51b4aabcc602f
https://doi.org/10.1117/12.2297653
https://doi.org/10.1117/12.2297653
Autor:
Hannah M. Ogden, Sandra A. Gutierrez Razo, Nikolaos Liaros, Amy S. Mullin, Gottlieb S. Oehrlein, Samuel R. Cohen, John T. Fourkas, Steven M. Wolf, Adam Pranda, Daniel E. Falvey, John E. Petersen
Publikováno v:
Novel Patterning Technologies 2018.
Three-color lithography (3CL) can produce high-resolution features using visible light. This technique uses one beam to pre-activate a photoresist, a second beam to deactivate it, and a third beam to activate the pre-activated regions that have not b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2057a685029b6c9e9917fa12099cfeb8
https://doi.org/10.1117/12.2299681
https://doi.org/10.1117/12.2299681
Publikováno v:
Journal of Vacuum Science & Technology B. 37:031802
The authors investigate the effect of substrate temperature on the migration of fluorocarbon film precursor species into a model high aspect ratio feature with precise temperature control and shielding from direct plasma line of sight interactions. I
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ea6df7d01e03fca66f40099c7d8f0f9
https://doi.org/10.1116/1.5092969
https://doi.org/10.1116/1.5092969
Publikováno v:
Plasma Processes and Polymers. 16:1900026
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4559bdbbe93918e900edc8a9e485c946
https://doi.org/10.1002/ppap.201900026
https://doi.org/10.1002/ppap.201900026
Autor:
Adam Pranda, Guido Grundmeier, Carles Corbella, Achim von Keudell, Gottlieb S. Oehrlein, Teresa de los Arcos, Sabine Portal
Publikováno v:
Plasma Processes and Polymers. 16:1900019
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e1337dc3865df2e1ee05887b42adf8f
https://doi.org/10.1002/ppap.201900019
https://doi.org/10.1002/ppap.201900019
Publikováno v:
Plasma Processes and Polymers. 15:1700217
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::131547fadcc3f4639901667460032011
https://doi.org/10.1002/ppap.201700217
https://doi.org/10.1002/ppap.201700217