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Autor:
Joseph F. Shepard, Henrik Johanson, Vandana Venkatasubramanian, Jay Mody, Takmeel Qanit, Ashwini Chandrasekar, Eswar Ramanathan, Craig Child, AnbuSelvam Km Mahalingam, Lei Jiang, Brett T. Cucci, Alycia Roux, O'brien Brendan, Christa Montgomery, Bradley Morganfeld, Keith Donegan, Colin Bombardier, Sang-Kee Eah, Vijaya Rana, Ghosh Somnath, Daniel Damjanovic, Anirvan Sircar, Zhiguo Sun, Singh Sunil K, Rebekah Sheraw, Ordonio Christopher, Silvestre MaryClaire, Adam DaSilva
Publikováno v:
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
As technology scaling continues, the selection of materials for sacrificial hard masks become very critical. Sacrificial hard masks are thin films that are used for patterning or protecting critical underlying films from damage during various process
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b80f0efb35ac3f6be7ae230059a989a
https://doi.org/10.1109/asmc.2019.8791788
https://doi.org/10.1109/asmc.2019.8791788
