Zobrazeno 1 - 10
of 97
pro vyhledávání: '"Achim von Keudell"'
Autor:
Gert Willems, Judith Golda, Dirk Ellerweg, Jan Benedikt, Achim von Keudell, Nikolas Knake, Volker Schulz-von der Gathen
Publikováno v:
New Journal of Physics, Vol 21, Iss 5, p 059501 (2019)
Externí odkaz:
https://doaj.org/article/64cbf2fa2b4344bcbccaa3ea5800dac2
Autor:
Rahel Buschhaus, Achim von Keudell
Publikováno v:
Plasma Sources Science and Technology.
Ion-induced secondary electron emission of surfaces occurs in all gas discharges which have contact to surfaces such as electrodes or chamber walls. These secondary electrons (SE) play an important role, for instance, in the performance of DC dischar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::93567508a8a4dd5222958ff58d4ce914
https://doi.org/10.1088/1361-6595/acd57e
https://doi.org/10.1088/1361-6595/acd57e
Autor:
Simon Kreuznacht, Maximilian Purcel, Simon Böddeker, Peter Awakowicz, Wei Xia, Martin Muhler, Marc Böke, Achim von Keudell
Publikováno v:
Plasma Processes and Polymers. 20:2200132
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39ce3479f6ec8746a4b3163540511b52
https://doi.org/10.1002/ppap.202200132
https://doi.org/10.1002/ppap.202200132
Autor:
J Held, Achim von Keudell
Publikováno v:
Plasma Chemistry and Plasma Processing. 40:643-660
High power impulse magnetron sputtering (HiPIMS) plasmas produce a very energetic growth flux for the synthesis of thin films with superior properties. High power densities in the range of a few $$\hbox {kW}/\hbox {cm}^2$$ are applied to a metal targ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::908accb6c1eafeda87875dacf0572a1d
https://doi.org/10.1007/s11090-019-10052-3
https://doi.org/10.1007/s11090-019-10052-3
Publikováno v:
Plasma Sources Science and Technology. 31:083001
Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by physical means, followed by deposition of those atoms on a nearby surface to form a thin film or coating. Various approaches and techniques are applied to rele
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ddd731699ce6b97fd36f326cb83e5507
https://doi.org/10.1088/1361-6595/ac7f53
https://doi.org/10.1088/1361-6595/ac7f53
Discharges in liquids are the basis of a range of applications in electrochemistry, wastewater treatment, or plasma medicine. One advantage of discharges in water is their ability to produce radicals and molecules directly inside liquid with a high c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::32b02110862da4d118ecdd1fa497d128
https://hss-opus.ub.ruhr-uni-bochum.de/opus4/frontdoor/index/index/docId/8090
https://hss-opus.ub.ruhr-uni-bochum.de/opus4/frontdoor/index/index/docId/8090
Publikováno v:
Plasma Sources Science and Technology. 31:025017
Ion-induced secondary electron emission at a target surface is an essential mechanism for laboratory plasmas, i.e. magnetron sputtering discharges. Electron emission, however, is strongly affected by the target condition itself such as oxidation. Dat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f1169152f7bd382a417712dd027152d5
https://doi.org/10.1088/1361-6595/ac4c4c
https://doi.org/10.1088/1361-6595/ac4c4c
Publikováno v:
Plasma Sources Science and Technology. 30:125006
Spokes are patterns of increased light emission, observed to rotate in front of the targets of magnetron sputtering discharges. They move through the plasma at velocities of several km s−1 in or against the E → × B → direction of the discharge
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5b752667448cb60fccadfba283b78c56
https://doi.org/10.1088/1361-6595/ac3210
https://doi.org/10.1088/1361-6595/ac3210
Publikováno v:
Vakuum in Forschung und Praxis. 28:24-27
Gepulste Hochleistungsplasmen (High Power Pulsed Magnetron Sputtering — HPPMS) eignen sich hervorragend zur Synthese von hochwertigen keramischen Schichten, da der Fluss der schichtbildenden Teilchen sehr energiereich ist. Diese besondere Form der
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31150425774b4355a17cca355aa024e8
https://doi.org/10.1002/vipr.201600599
https://doi.org/10.1002/vipr.201600599
Autor:
Ante Hecimovic, Achim von Keudell
Publikováno v:
Journal of Physics D: Applied Physics
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f1e18c001215a2148979676aea2ffca5
https://hdl.handle.net/21.11116/0000-0002-1BED-621.11116/0000-0002-1BEF-421.11116/0000-0002-9753-6
https://hdl.handle.net/21.11116/0000-0002-1BED-621.11116/0000-0002-1BEF-421.11116/0000-0002-9753-6