Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Abramenkov, A. D."'
Publikováno v:
Russian: The Physics of Metals and Metallography, vol. 30, no. 6, pp. 1310-1312, 1970
The experimental research on the nature of diffusion by the Mo substrate atoms into the Ti and Cr deposited thin films is completed by the secondary ion-ion emission method. In [1], the initial stage of the Ti thin film on the Mo substrate deposition
Externí odkaz:
http://arxiv.org/abs/1209.4750
Publikováno v:
Metal Science and Heat Treatment; March 1969, Vol. 11 Issue: 3 p209-211, 3p
Publikováno v:
Refractories; January 1978, Vol. 19 Issue: 1-2 p78-79, 2p