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Autor:
JJ Beulens, CJ Timmermans, Atm Wilbers, Thj Bisschops, Gmw Gerrit Kroesen, Ajm Buuron, GJ Gijs Meeusen, Abm Bertus Husken, L A Bisschops, DC Daan Schram
Publikováno v:
Le Journal de Physique Colloques. 51:C5-361
By separating plasma production and plasma deposition and by taking advantage of the high specific ionizing power of thermal plasmas, very high deposition rates on large areas of amorphous C-H and Si-H are obtained. The layers have been analyzed by s