Investigating the effect of nitrogen on the structural and tribo-mechanical behavior of vanadium nitride thin films deposited using R.F. magnetron sputtering

Autor: Mohammed Abdul Samad, Akram Alhussein, Mamoun Fellah, Aleksei Obrosov, Corinne Nouveau, Linda Aissani, Ablel Hakim Chadli, Faiza Salhi, Abderrahmane Cheriet, Sabine Weiß

Publikováno v: Journal of Materials Science
Journal of Materials Science, 2021, 56 (30), pp.17319-17336. ⟨10.1007/s10853-021-06393-0⟩

Magnetron sputtering is one of the most commonly used deposition techniques, which has received considerable attention in industrial applications. In particular, owing to its compatibility with conventional fabrication processes, it can produce and f

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0c808d8d8e4759fe58985b3127e46ea7
https://doi.org/10.1007/s10853-021-06393-0