Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Abel FM"'
Autor:
Abel FM; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Correa EL; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States.; Theiss Research, La Jolla, California 92037, United States., Bui TQ; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Biacchi AJ; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Donahue MJ; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Merritt MT; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States.; Morgan State University, Baltimore, Maryland 21251, United States., Seppala JE; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Woods SI; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Hight Walker AR; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Dennis CL; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2024 Oct 09; Vol. 16 (40), pp. 54328-54343. Date of Electronic Publication: 2024 Sep 25.
Autor:
Abel FM; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Correa EL; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Biacchi AJ; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Bui TQ; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Woods SI; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Hight Walker AR; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States., Dennis CL; National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2023 Mar 15; Vol. 15 (10), pp. 13439-13448. Date of Electronic Publication: 2023 Mar 06.
Autor:
Abel FM; Department of Physics and Astronomy, University of Delaware Newark DE 19716 USA fabel@udel.edu frank.m.abeliii@gmail.com., Pourmiri S; Department of Physics and Astronomy, University of Delaware Newark DE 19716 USA fabel@udel.edu frank.m.abeliii@gmail.com., Basina G; Department of Chemical Engineering, Khalifa University of Science and Technology, Petroleum Institute P. O. Box 2533 Abu Dhabi United Arab Emirates., Tzitzios V; Department of Chemical Engineering, Khalifa University of Science and Technology, Petroleum Institute P. O. Box 2533 Abu Dhabi United Arab Emirates.; Institute of Nanoscience and Nanotechnology, NCSR Demokritos Athens 15310 Greece v.tzitzios@inn.demokritos.gr., Devlin E; Institute of Nanoscience and Nanotechnology, NCSR Demokritos Athens 15310 Greece v.tzitzios@inn.demokritos.gr., Hadjipanayis GC; Department of Physics and Astronomy, University of Delaware Newark DE 19716 USA fabel@udel.edu frank.m.abeliii@gmail.com.
Publikováno v:
Nanoscale advances [Nanoscale Adv] 2019 Oct 07; Vol. 1 (11), pp. 4476-4480. Date of Electronic Publication: 2019 Oct 07 (Print Publication: 2019).
Autor:
Tosun O; Department of Physics and Astronomy, University of Delaware, Newark, DE 19711, USA. onurt@udel.edu., Abel FM; Department of Physics and Astronomy, University of Delaware, Newark, DE 19711, USA. fabel@udel.edu., Balasubramanian B; Department of Physics and Astronomy, University of Nebraska, Lincoln, NE 68588, USA. balamurugan@unl.edu.; Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, NE 68588, USA. balamurugan@unl.edu., Skomski R; Department of Physics and Astronomy, University of Nebraska, Lincoln, NE 68588, USA. rskomski@neb.rr.com.; Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, NE 68588, USA. rskomski@neb.rr.com., Sellmyer DJ; Department of Physics and Astronomy, University of Nebraska, Lincoln, NE 68588, USA. dsellmyer@unl.edu.; Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, NE 68588, USA. dsellmyer@unl.edu., Hadjipanayis GC; Department of Physics and Astronomy, University of Delaware, Newark, DE 19711, USA. hadji@udel.edu.
Publikováno v:
Nanomaterials (Basel, Switzerland) [Nanomaterials (Basel)] 2019 Sep 25; Vol. 9 (10). Date of Electronic Publication: 2019 Sep 25.