Zobrazeno 1 - 10 of 34 pro vyhledávání: '"Abdou Djouadi"'
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Akademický článek
A Novel Method of Synthesizing Graphene for Electronic Device Applications
Autor: Nierlly Galvão, Getúlio Vasconcelos, Rodrigo Pessoa, João Machado, Marciel Guerino, Mariana Fraga, Bruno Rodrigues, Julien Camus, Abdou Djouadi, Homero Maciel
Publikováno v: Materials, Vol 11, Iss 7, p 1120 (2018)
This article reports a novel and efficient method to synthesize graphene using a thermal decomposition process. In this method, silicon carbide (SiC) thin films grown on Si(100) wafers with an AlN buffer layer were used as substrates. CO2 laser beam
Externí odkaz: https://doaj.org/article/e404914fd4f24ef2bfdd1ffa3f96bc82
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4
Hetero-Epitaxial Growth of AlN Deposited by DC Magnetron Sputtering on Si(111) Using a AlN Buffer Layer
Autor: M. Rammal, N. Rouag, Raouia Zernadji, Badis Riah, Mohamed Abdou Djouadi, A. Ayad, J. Camus
Publikováno v: Coatings, Vol 11, Iss 1063, p 1063 (2021)
Coatings
Coatings, MDPI, 2021, 11 (9), pp.1063. ⟨10.3390/coatings11091063⟩
Volume 11
Issue 9
This paper reports the effect of Silicon substrate orientation and Aluminum nitride buffer layer deposited by molecular beam epitaxy on the growth of aluminum nitride thin films deposited by a DC magnetron sputtering technique at low temperatures. Th
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2229fb5e64db9d68ccbf52e76ddab553
https://www.mdpi.com/2079-6412/11/9/1063
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5
AlN Etching under ICP Cl2/BCl3/Ar Plasma Mixture: Experimental Characterization and Plasma Kinetic Model
Autor: Alexandre Shen, Abdou Djouadi, Delphine Néel, Dalila Make, M. Rammal, Ahmed Rhallabi
Publikováno v: MRS Advances
MRS Advances, Cambridge University Press, 2019, 4 (27), pp.1579-1587. ⟨10.1557/adv.2019.84⟩
AlN etching with chloride plasmas is studied. The experimental results show that the etching of AlN under a low pressure Cl2/Ar plasma mixture in moderate DC bias is not possible. The addition of BCl3 gas to Cl2/Ar mixture allows the etching of AlN m
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::465d46e00819f506b2dc50d64dad28b5
https://doi.org/10.1557/adv.2019.84
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6
Optoelectronic properties of ZnO thin films grown by radio frequency magnetron sputtering
Autor: Mohamed Abdou Djouadi, Saâd Rahmane
Publikováno v: Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics, Springer Verlag, 2020, ⟨10.1007/s10854-020-04340-4⟩
In the present work, Zinc oxide (ZnO) thin films with suitable optoelectronic properties required for application as transparent electrodes have been grown successfully on glass and silicon substrates by radio frequency magnetron sputtering technique
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e9473c7a9a5309dd43705d6144fe7d6e
https://hal.archives-ouvertes.fr/hal-03010369
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7
Design and Characterization of High-Q SAW Resonators Based on the AlN/Sapphire Structure Intended for High-Temperature Wireless Sensor Applications
Autor: Sami Hage-Ali, J. Camus, M. Rammal, Jeremy Streque, Omar Elmazria, Thierry Laroche, Mohamed Abdou Djouadi, Thierry Aubert, Hamid M'Jahed, Sylvain Ballandras
Publikováno v: IEEE Sensors Journal
IEEE Sensors Journal, Institute of Electrical and Electronics Engineers, 2020, 20 (13), pp.6985-6991. ⟨10.1109/JSEN.2020.2978179⟩
International audience; Aluminium nitride piezoelectric thin films grown on sapphire are strong candidates for high-temperature surface acoustic wave (SAW) sensors, due to their thermal stability, large bandgap, high acoustic velocity and suitable el
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::988328e5640f6d1f7dbade524193e92a
https://hal.archives-ouvertes.fr/hal-02865522/document
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8
Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers
Autor: J. García Molleja, J. Bürgi, Edoardo Bemporad, Guinther Kellermann, R. Neuenschwander, Daniele De Felicis, Mohamed Abdou Djouadi, Aldo F. Craievich, Mattia Piccoli, Jorge Feugeas, Pierre-Yves Jouan
Publikováno v: Repositório Institucional da USP (Biblioteca Digital da Produção Intelectual)
Universidade de São Paulo (USP)
instacron:USP
Journal of Physical Chemistry B
Journal of Physical Chemistry B, American Chemical Society, 2019, 123 (7), pp.1679-1687. ⟨10.1021/acs.jpcb.8b09496⟩
This article reports the design, construction, and first use of an experimental device consisting of a specially designed vacuum chamber equipped with a reactive sputtering magnetron (RSM) to be used for controlled deposition of thin films on a Si(10
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5597066610dac9311c393a05d4180ebc
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9
A Novel Method of Synthesizing Graphene for Electronic Device Applications
Autor: Mohamed Abdou Djouadi, Marciel Guerino, Bruno V.M. Rodrigues, N. K. A. M. Galvão, João Paulo Barros Machado, Homero Santiago Maciel, Mariana A. Fraga, J. Camus, Getúlio Vasconcelos, Rodrigo Sávio Pessoa
Publikováno v: Materials, Vol 11, Iss 7, p 1120 (2018)
Materials
Volume 11
Issue 7
Materials, MDPI, 2018, 11 (7), ⟨10.3390/ma11071120⟩
This article reports a novel and efficient method to synthesize graphene by thermal decomposition process. In this method, silicon carbide (SiC) thin films grown on Si(100) wafers with an AlN buffer layer were used as substrates. A CO2 laser beam hea
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ab717cb02b7618a75d3eee94f2efee80
http://www.mdpi.com/1996-1944/11/7/1120
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10
Metal/Carbon Hybrid Nanostructures Produced from Plasma-Enhanced Chemical Vapor Deposition over Nafion-Supported Electrochemically Deposited Cobalt Nanoparticles
Autor: Mohammed Boujtita, Sofia Javed, Amine Achour, Mohammad Islam, Khalid Saeed, Mohamed Abdou Djouadi
Publikováno v: Materials
Materials, MDPI, 2018, 11 (5), ⟨10.3390/ma11050687⟩
Materials, Vol 11, Iss 5, p 687 (2018)
Materials; Volume 11; Issue 5; Pages: 687
In this work, we report development of hybrid nanostructures of metal nanoparticles (NP) and carbon nanostructures with strong potential for catalysis, sensing, and energy applications. First, the etched silicon wafer substrates were passivated for s
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::00258830b4af17e66061689711235c61
https://hal.archives-ouvertes.fr/hal-01848371
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