Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Abdelkarim Ferchichi"'
Autor:
Mikhail R. Baklanov, Alec Goodyear, Nicholas Braithwaite, Abdelkarim Ferchichi, Vladimir Samara, Patrick Verdonck, Els Van Besien
Publikováno v:
Thin Solid Films. 520:464-468
In this study, special tests were devised in order to investigate the influence of ion bombardment on the damage induced in low-k dielectrics by oxygen plasmas. By placing a sample that suffered a lot of ion bombardment and one which suffered little
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d6fda5d986b0ef1b60ca7d1a0e5fb514
https://doi.org/10.1016/j.tsf.2011.06.046
https://doi.org/10.1016/j.tsf.2011.06.046
Autor:
Christos Trompoukis, Abdelkarim Ferchichi, E. Van Besien, Patrick Verdonck, D. De Roest, M. Baklanov, B. Stafford, M. Aresti
Publikováno v:
Microelectronic Engineering. 88:627-630
The use of low-k materials is essential for improving the quality of integrated circuits. Subsequent process steps may however modify this film to the extent that the final result is unacceptable. Organosilicate-based low-k films, with a nominal k-va
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9d32001bf83aa8df96ccda5c319d081c
https://doi.org/10.1016/j.mee.2010.06.011
https://doi.org/10.1016/j.mee.2010.06.011
Publikováno v:
Journal of Non-Crystalline Solids
Journal of Non-Crystalline Solids, Elsevier, 2010, 356 (6-8), pp.287-289. ⟨10.1016/j.jnoncrysol.2009.12.009⟩
Journal of Non-Crystalline Solids, Elsevier, 2010, 356 (6-8), pp.287-289. ⟨10.1016/j.jnoncrysol.2009.12.009⟩
We computed by a modified tight binding approximation, the total electronic energy of three different hybrid polymers: $H-SiO_2$, $CH_3-SiO_2$ and $C_6H_5-SiO_2$. We made the hypothesis that the structures of these polymers are amorphous. Computation
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::18812018110738bf70df11b054724737
https://hal.archives-ouvertes.fr/hal-00486201
https://hal.archives-ouvertes.fr/hal-00486201
Autor:
Mihoko Matsutani, Thierry Conard, Abdelkarim Ferchichi, Yukiharu Ono, Patrick Verdonck, Koji Nakatani, Marianna Pantouvaki, Mikhail R. Baklanov, Kris Vanstreels
Publikováno v:
Journal of Applied Physics. 109:074301
The interface adhesion strength of an advanced polymeric low-k material to different metal barriers was quantitatively measured using the four-point bending technique. Different sample configurations were tested in order to find the optimal configura
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b8ce58232ad138ef6c4e8274070ddf8
https://doi.org/10.1063/1.3561434
https://doi.org/10.1063/1.3561434