Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Abbas Hodroj"'
Publikováno v:
AIMS Materials Science, Vol 5, Iss 3, Pp 519-532 (2018)
Nanocrystalline diamond NCD coatings could improve the performances of cutting tools if the adhesion on cobalt-cemented tungsten carbide WC–Co substrates was optimized and maintained during diamond deposit. In this study, a time modulated polarized
Externí odkaz:
https://doaj.org/article/6cd218dfdb6e4b25b47e9f8d6c750015
Publikováno v:
AIMS Materials Science
AIMS Materials Science, AIMS Press, 2018, 5 (3), pp.519-532. ⟨10.3934/matersci.2018.3.519⟩
AIMS Materials Science, Vol 5, Iss 3, Pp 519-532 (2018)
AIMS Materials Science, AIMS Press, 2018, 5 (3), pp.519-532. ⟨10.3934/matersci.2018.3.519⟩
AIMS Materials Science, Vol 5, Iss 3, Pp 519-532 (2018)
International audience; Nanocrystalline diamond NCD coatings could improve the performances of cutting tools if the adhesion on cobalt-cemented tungsten carbide WC–Co substrates was optimized and maintained during diamond deposit. In this study, a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f67cfabeae87e6f8ea9d305530507294
https://hal.archives-ouvertes.fr/hal-01916713
https://hal.archives-ouvertes.fr/hal-01916713
Publikováno v:
Journal of the American Ceramic Society. 96:2454-2460
The morphological and structural properties of sodium silicate (Na2O–SiO2) glasses were analyzed using atomic force microscopy (AFM) and light scattering following thermal treatments. AFM observations indicated that the glass surface microstructure
Publikováno v:
Journal of Materials Research
Journal of Materials Research, Cambridge University Press (CUP), 2008, 23 (3), pp.755. ⟨10.1557/JMR.2008.0088⟩
Journal of Materials Research, Cambridge University Press (CUP), 2008, 23 (3), pp.755. ⟨10.1557/JMR.2008.0088⟩
Ti–Si–O thin films were deposited using an aerosol chemical vapor deposition process at atmospheric pressure. The film structure and microstructure were analyzed using several techniques before and after thermal annealing. Diffraction results ind
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1833296650107927c4bf97cfd243931c
https://hal.archives-ouvertes.fr/hal-00261588
https://hal.archives-ouvertes.fr/hal-00261588
Publikováno v:
Journal of The Electrochemical Society. 155:D110
We present the deposition of amorphous Ti-Si-O thin films by an aerosol chemical vapor deposition process at atmospheric pressure. We used di-acetoxi-di-butoxisilane, tetrabutoxysilane, and titanium(IV) n-butoxide as precursors, and the deposition te