Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Aaron O. Vanderpool"'
Autor:
Aaron O. Vanderpool, M. Taylor
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 237:142-147
A method to reduce the diffusion of boron in ultra-shallow junctions (USJ) has been found using the co-implantation of fluorine and carbon. In this 24 designed experiment a 40% reduction of B diffusion in the presence of a shallow F and C implant was
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df616d72aa0fc9fc1c3fdd7de0c8aa58
https://doi.org/10.1016/j.nimb.2005.04.089
https://doi.org/10.1016/j.nimb.2005.04.089
Publikováno v:
AIP Conference Proceedings.
The production of Ultra Shallow Junctions (USJ) in silicon devices requires controlling the Transient Enhanced Diffusion (TED) of electrical dopants. USJ development has focused on boron because hole mobility is lower than electron mobility in silico
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c7541915c8f94946e92aad3b9436cabd
https://doi.org/10.1063/1.2401457
https://doi.org/10.1063/1.2401457