Zobrazeno 1 - 8
of 8
pro vyhledávání: '"ANIL KUMAR T. V."'
Autor:
Jaisoorya T. S., Shiju Joseph, Kalarani K. S., Maya Menon, Smita G. S., Shini V. S., Sheril Elizabeth Jose, Mahesh M. M., Shibu K, Sujisha T. G., Jayaprakashan K. P., Kiran P. S., Anil Kumar T. V., Vigneshwari V., Usha Titus
Publikováno v:
Indian Journal of Psychological Medicine, Vol 45 (2022)
Background: Mental health issues are common among college students, and structured services have been proven to enhance outcomes. Despite increased enrolment for higher education in India, college mental health services remain sparse. JEEVANI is the
Externí odkaz:
https://doaj.org/article/12b703fde4274e2987894a2c8f52b327
Autor:
Sajeesh Parameswaran, Ponnu Sankarapillai, Ajith Mohan, Anil Kumar T V, Aswin Ganesh M, A Marthanda Pillai
Publikováno v:
IP Indian Journal of Neurosciences. 8:286-288
Narcolepsy is a rare disorder of sleep wake cycle which can result in persistent excessive day time sleepiness. It is due to the deficiency of the Orexin/Hypocretin in the body. Most of these cases are reported in young adults and are difficult to di
Autor:
Jaisoorya T. S., Joseph, Shiju, Kalarani K. S., Menon, Maya, Smita G. S., Shini V. S., Jose, Sheril Elizabeth, Mahesh M. M., Shibu K, Sujisha T. G., Jayaprakashan K. P., Kiran P. S., Anil Kumar T. V., Vigneshwari V., Titus, Usha
Publikováno v:
Indian Journal of Psychological Medicine; Sep2023, Vol. 45 Issue 5, p526-532, 7p
Autor:
null Jaisoorya T. S., Shiju Joseph, null Kalarani K. S., Maya Menon, null Smita G. S., null Shini V. S., Sheril Elizabeth Jose, null Mahesh M. M., null Shibu K, null Sujisha T. G., null Jayaprakashan K. P., null Kiran P. S., null Anil Kumar T. V., null Vigneshwari V., Usha Titus
Publikováno v:
Indian Journal of Psychological Medicine. :025371762211224
Background: Mental health issues are common among college students, and structured services have been proven to enhance outcomes. Despite increased enrolment for higher education in India, college mental health services remain sparse. JEEVANI is the
Autor:
Anil Kumar T V
102
Nanoimprint Lithography: Si master molds are generally patterned by electron-beam lithography (EBL) that is known to be a time consuming nano patterning technique. Thus, developing mold duplication process based on high throughput technique
Nanoimprint Lithography: Si master molds are generally patterned by electron-beam lithography (EBL) that is known to be a time consuming nano patterning technique. Thus, developing mold duplication process based on high throughput technique
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/xqm526
Publikováno v:
Journal of Tourism; 2015, Vol. 16 Issue 1, p49-57, 9p
Publikováno v:
2013 IEEE 8th Nanotechnology Materials & Devices Conference (NMDC); 2013, p84-87, 4p
Publikováno v:
Indian Journal of Psychiatry; Oct-Dec2012, Vol. 54 Issue 4, p352-355, 4p