Zobrazeno 1 - 10
of 17
pro vyhledávání: '"ABE, Tomohiko"'
Autor:
YAMAJI, Akihiko, MASUDA, Aritoshi, MANAKA, Tomohisa, ABE, Tomohiko, SAITO, Yasuharu, SAITO, Yoichi
Publikováno v:
京都大学防災研究所年報. B. 65:199-203
In recent years, heavy rain disasters caused by line-shaped rainband have become a major problem. Early evacuation is important in order to protect human life, but it is difficult to accurately predict the occurrence of line-shaped rainband, which is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=jairo_______::ecff7623a91aa0b98bc6242bc007774f
http://hdl.handle.net/2433/279427
http://hdl.handle.net/2433/279427
Publikováno v:
E3S Web of Conferences, Vol 346, p 03020 (2022)
It is important for hydropower dams to estimate PMP (Probable Maximum Precipitation) appropriately and to prepare the plan of facilities modification and operational changes in advance, because the future flood risk by climate change influence is get
Externí odkaz:
https://doaj.org/article/ab84ca63559143298e3d8c1962a43d5b
Autor:
Hiromi Fujiwara, Abe Tomohiko
Publikováno v:
Cement Science and Concrete Technology. 74:404-411
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::99c0680f0ecdd897fa28d7d4f521d181
https://doi.org/10.14250/cement.74.404
https://doi.org/10.14250/cement.74.404
Publikováno v:
Alternative Lithographic Technologies V.
The authors designed novel electron beam slim column cells that have the outer diameters of 60mm and 40mm in width for an e-beam exposure of patterns down to 12nm and below. The column has maximum magnetic flux density of less than 2.2Tesla in the po
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::484986f7936dec355927c2a5f88198bd
https://doi.org/10.1117/12.2011376
https://doi.org/10.1117/12.2011376
Autor:
Katsuki, Akihiko, Nakamura, Tatsuya, Mizuki, Tatsuya, Shibahara, Kohei, Abe, Tomohiko, Ikeda, Tomohiko, Maeyama, Shigetaka
Publikováno v:
2014 International Power Electronics Conference (IPEC-Hiroshima 2014 - ECCE ASIA); 2014, p1575-1579, 5p
Autor:
Abe Tomohiko, Maruyama Shigeru, Takashi Kiuchi, Junichi Kai, Hiroshi Yasuda, Soichiro Arai, Yoshihisa Ooae
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:3813
A blanking aperture array (BAA) has 1024, 25‐μm‐square apertures and blanking electrodes on a 20‐μm‐thick Si membrane with a total aperture ratio of 1/6. These apertures are irradiated with an electron beam, and the electrons passing throug
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::01f09bf454b2ceb3fa422b513be87131
https://doi.org/10.1116/1.588673
https://doi.org/10.1116/1.588673
Autor:
Hiroshi Yasuda, Manabu Ohno, Akio Ookura, Akio Yamada, Kiichi Sakamoto, Shunsuke Fueki, Kobayashi Katsuhiko, Abe Tomohiko, Satoru Sagoh, Takemoto Akio, Junichi Kai, Takamasa Satoh, Yoshihisa Oae, Yamazaki Satoru, Hisayasu Nishino
Publikováno v:
Japanese Journal of Applied Physics. 32:6006
The NOWEL-3 block exposure system that we developed contains a data transaction system, high-speed exposure control hardware and a column which has a block mask and mask deflectors. The block patterns are taken from LSI design data. Three kinds of fo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::63175ee51e36cd676e4244f17f481106
https://doi.org/10.1143/jjap.32.6006
https://doi.org/10.1143/jjap.32.6006
Autor:
Yoshihisa Ooae, Sigeru Maruyama, Soichiro Arai, Yasushi Takahashi, Syunsuke Hueki, Hiroshi Yasuda, Sago Satoru, Junichi Kai, Abe Tomohiko, Keiichi Betsui
Publikováno v:
Japanese Journal of Applied Physics. 32:6012
A new electron beam lithography system with a two-dimensional blanking aperture array (BAA) is proposed. The BAA produces 1024 individually controlled beams. The demagnification ratio of BAA on the wafer is 0.3%. An actual BAA device was fabricated a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a34e7a28c0f12537864799c5e9af7bb
https://doi.org/10.1143/jjap.32.6012
https://doi.org/10.1143/jjap.32.6012
Autor:
S. Yamazaki, K. Kobayashi, K. Sakamoto, Yoshihisa Oae, H. Nishino, Hiroshi Yasuda, Akio Yamada, S. Sago, S. Fueki, T. Satoh, A. Ookura, Abe Tomohiko, A. Takemoto, M. Oono
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 11:2357
A block exposure system is developed to expose a 256 M DRAM pattern. Four mask deflectors deflect beams to select one of 48 blocks of stencil patterns in a 5 mm region in diameter on a mask. Each mask pattern is extracted as a unit of repetitions fro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::66952e931198c124791f6b2b43bacd65
https://doi.org/10.1116/1.586986
https://doi.org/10.1116/1.586986
Autor:
Yasuda, Hiroshi, Arai, Soichiro, Kai, Jun-ichi, Ooae, Yoshihisa, Abe, Tomohiko, Maruyama, Shigeru, Kiuchi, Takashi
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 6, p3813-3820, 8p