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Autor:
O.E. Dnitrieva, Zh.L. Korobitsina, A.A. Shinanskiy, V.A. Schveigert, E.G. Tishkovsky, P.A. Androsenko, A.M. Bekesheva, T.M. Lukhanova, Yu.P. Zhydkov, I.V. Schveigert, A.L. Alexsandrov, G.V. Gadiyak, M.S. Obrekht, V.M. Bedanov, E.E. Dagnan, M.S. Ivanov, V.P. Ginkin
Publikováno v:
COMPEL - The international journal for computation and mathematics in electrical and electronic engineering. 11:445-455
In this paper the MOPIT system for the simulation of devices and manufacturing processes is presented. The MOPIT system is meant for the simulation of the following semiconductor processing : ion implantation of impurities , diffusion , radiation enh