Zobrazeno 1 - 10
of 77
pro vyhledávání: '"A.A. Ketterson"'
Publikováno v:
IEEE Transactions on Electron Devices. 44:2136-2142
The DC and microwave characteristics of two sets of AlGaAs/InGaAs PHEMTs having a gate length of 0.2 /spl mu/m are compared. The first set is composed of devices fabricated using a trilayer electron beam resist process for T-gate recess and metalliza
Publikováno v:
Solid-State Electronics. 38:517-524
GaAs MESFETs with gate lengths from 55 to 150 nm have been fabricated and characterized. By using selective etching for the gate recess, the channel thickness as well as the aspect ratio of the devices of each gate length are known accurately. A cuto
Publikováno v:
Journal of Electronic Materials. 22:375-381
The effects of selective reactive ion etching (SRIE) using SiCl4/SiF4 plasma on delta-doped GaAs/Al0.3Ga0.7As modulation-doped field-effect transistor (MODFET) structures and devices have been investigated. The results are compared with those of corr
Autor:
K. Nummila, Kangguo Cheng, Ilesanmi Adesida, M. Tong, J.-W. Seo, A.A. Ketterson, J.J. Morikuni, Sung-Mo Kang
Publikováno v:
IEEE Transactions on Electron Devices. 40:1406-1416
The design, fabrication, and characterization of a 0.85- mu m sensitive photoreceiver is described. The monolithically integrated optoelectronic receiver is based on pseudomorphic InGaAs on GaAs modulation-doped field-effect transistors (MODFETs) and
Publikováno v:
Journal of Electronic Materials. 21:9-15
The etching characteristics of AlxGa1-xAs in citric acid/H2O2 solutions and SiCl4/SiF4 plasmas have been studied. Using a 4:1 solution of citric acid/H2O2 at 20° C, selectivities of 155, 260, and 1450 have been obtained for GaAs on AlxGa1-xAs withx
Publikováno v:
Cryogenics. 30:1134-1139
This paper reports on the d.c. and high frequency characteristics of pseudomorphic AlGaAs/InGaAs/GaAs MODFETs with gate lengths from 1.73 to 0.35 μm at 300 and 110 K. Significant device improvement is shown at 110 K, with current gain cut-off freque
Autor:
James Kolodzey, Ilesanmi Adesida, S. Agarwala, J. Laskar, A.A. Ketterson, T. L. Brock, Hadis Morkoç
Publikováno v:
Microelectronic Engineering. 11:69-72
0.2 μm T-gate MODFETs have been fabricated and characterized in a planar-doped, lattice-matched InAlAs/InGaAs/InP heterostructure. Extrinsic dc tranconductance as high as 704 mS/mm with very good pinch-off characteristics have been obtained in these
Autor:
S. Boor, K. C. Hsieh, A.A. Ketterson, Alfred Y. Cho, T. L. Brock, Seref Kalem, J. Laskar, S. Caracci, James Kolodzey, D. Sivco, Ilesanmi Adesida
Publikováno v:
Journal of Electronic Materials. 19:249-252
We report on the electrical and microstructural properties of InP/GaxIn1-xAs/Al0.48In0.52As modulation doped layers having compositionally graded active channels with different channel thicknesses. The layers were grown by solid source molecular beam
Autor:
A.A. Ketterson, J.-W. Seo, M. Tong, L. Adesida, D. Ballegeer, K. Nummila, Sung-Mo Kang, Kangguo Cheng
Publikováno v:
Summer Topical Meeting Digest on Broadband Analog and Digital Optoelectronics, Optical Multiple Access Networks, Integrated Optoelectronics, Smart Pixels.
Publikováno v:
LEOS 1992 Summer Topical Meeting Digest on Broadband Analog and Digital Optoelectronics, Optical Multiple Access Networks, Integrated Optoelectronics, and Smart Pixels.
The authors have fabricated and characterized MODFETs on OMVPE (organometallic vapor-phase epitaxy)-grown InAlAs/InGaAs/InP heterostructures. Excellent DC and RF characteristics were obtained. Extrinsic DC transconductance as high as 1020 mS/mm and a