Zobrazeno 1 - 10
of 153
pro vyhledávání: '"A. Vaglio Pret"'
Publikováno v:
Proceedings of SPIE; March 2024, Vol. 12913 Issue: 1 p129130T-129130T-6, 1162177p
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Autor:
Naulleau, Patrick P., Gargini, Paolo A., Itani, Toshiro, Ronse, Kurt G., Kim, Eunju, Kim, Wooseok, Lee, Jonggwan, Kim, Seongjong, Lee, Sukyong, Kwak, Nohong, Kang, Mincheol, Jeong, Yongchul, Hwang, Myungsoo, Park, Chang-Min, Koo, Kyoil, Jeong, Seongtae, Biafore, John, Smith, Mark, Graves, Trey, Burov, Anatoly, Vukkadala, Pradeep, Parsey, Guy, Zhang, Cao, Bai, Kunlun, Krek, Janez, Higgins, Craig, Bakarian, Sergei, Ko, Kyeongeun, Gronheid, Roel, Sah, Kaushik, Cross, Andrew, Liu, Yi, Vaglio Pret, Alessandro, Walker, Chris, Tolani, Vikram, Hwa, George, Hu, Peter, Song, Chang, Arkhipov, Alex, Bouckou, Loemba, Liu, Chi-Ping, Yang, Xiaochun, O'Hara, Kana, Son, Donghwan
Publikováno v:
Proceedings of SPIE; November 2023, Vol. 12750 Issue: 1 p127500C-127500C-13, 12622514p
Publikováno v:
Photomask Technology 2022.
Autor:
Prem Panneerchelvam, Chad Huard, Ankur Agarwal, Alessandro Vaglio Pret, Antonio Mani, Roel Gronheid, Marc Demand, Kaushik Kumar
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Autor:
Vaglio Pret, Alessandro, Kunnen, Eddy, Gronheid, Roel, Pargon, Erwine, Luere, Olivier, Bianchi, Davide
Publikováno v:
In Microelectronic Engineering October 2013 110:100-107
Autor:
Vaglio Pret, Alessandro, Poliakov, Pavel, Gronheid, Roel, Blomme, Pieter, Miranda Corbalan, Miguel, Dehaene, Wim, Verkest, Diederik, Van Houdt, Jan, Bianchi, Davide
Publikováno v:
In Microelectronic Engineering October 2012 98:24-28
Autor:
Prem Panneerchelvam, Ankur Agarwal, Chad M. Huard, Alessandro Vaglio Pret, Antonio Mani, Roel Gronheid, Marc Demand, Kaushik Kumar, Sara Paolillo, Frederic Lazzarino
Publikováno v:
Journal of Vacuum Science & Technology B. 40:062601
Quantitatively accurate, physics-based, computational modeling of etching and lithography processes is essential for modern semiconductor manufacturing. This paper presents lithography and etch models for a trilayer process in a back end of the line
Publikováno v:
In Microelectronic Engineering August 2011 88(8):2167-2170
Publikováno v:
In Microelectronic Engineering 2010 87(5):1127-1130