Zobrazeno 1 - 10
of 92
pro vyhledávání: '"A. V. Eskov"'
Autor:
A. A. Ershov, K. N. Chekmezov, A. P. Burovikhin, A. A. Nikitin, S. N. Abolmasov, A. A. Stashkevich, E. I. Terukov, A. V. Eskov, A. A. Semenov, A. B. Ustinov
Publikováno v:
Известия высших учебных заведений России: Радиоэлектроника, Vol 27, Iss 2, Pp 119-131 (2024)
Introduction. Silicon nitride is a highly promising material for fabrication of photonic integrated circuits (PICs). Plasma-enhanced chemical vapor deposition is a prospective method for large-scale industrial production of silicon nitride-based PICs
Externí odkaz:
https://doaj.org/article/93639c18cdc94154ba7fc8c3554e925f
Publikováno v:
Complexity. Mind. Postnonclassic. 11:16-24
Publikováno v:
Complexity. Mind. Postnonclassic. :60-71
Autor:
Yuliya Bashkatova, V. Eskov
Publikováno v:
Complexity. Mind. Postnonclassic. :25-32
Publikováno v:
Complexity. Mind. Postnonclassic. :5-16
Autor:
V. Eskov
Publikováno v:
Complexity. Mind. Postnonclassic. :33-42
Autor:
V. Eskov
Publikováno v:
Complexity. Mind. Postnonclassic. :71-78
Publikováno v:
Complexity. Mind. Postnonclassic. :50-61
Publikováno v:
Complexity. Mind. Postnonclassic. :28-49
Publikováno v:
Complexity. Mind. Postnonclassic. :52-60