Zobrazeno 1 - 10
of 27
pro vyhledávání: '"A. S. Dzhumaliev"'
Publikováno v:
Physics of the Solid State. 62:2439-2444
The effect of the bias voltage Ub and the deposition rate $${v}$$ on the structure, grain size D, and coercivity Hc of NiFe films with a thickness d from 30 to 980 nm, grown on Si/SiO2 substrates by DC magnetron sputtering, has been studied. In the c
Autor:
Yu. V. Nikulin, Yu. V. Khivintsev, Yu. A. Filimonov, A. V. Kozhevnikov, S. L. Vysotskii, V. K. Sakharov, A. S. Dzhumaliev, S. A. Nikitov, A. I. Stognij
Publikováno v:
Technical Physics. 65:1175-1180
The effect is studied of tensile deformations on the spectrum of the ferromagnetic resonance of submicron yttrium–iron garnet polycrystalline films manufactured by means of ion-beam sputtering onto silicon and gallium arsenide substrates. Magnetoel
Publikováno v:
Technical Physics. 63:1678-1686
The influence of argon pressure P (0.13 ≤ P ≤ 1 Pa) and vacuum annealing on the microstructure and texture of d ≈ 300 nm thick cobalt films magnetron-sputtered on a SiO2/Si substrate has been investigated. It has been shown that the films depos
Autor:
Alexander Khitun, G. M. Dudko, V. K. Sakharov, Yu. V. Khivintsev, Yu. V. Nikulin, S. L. Vysotskii, A. S. Dzhumaliev, Yu. A. Filimonov, S. A. Nikitov, A. V. Kozhevnikov
Publikováno v:
Journal of Communications Technology and Electronics. 63:1047-1052
The ferromagnetic resonance spectrum at a frequency of ~9.85 GHz for an in-plane magnetized 2D square lattice with the unit cell parameter а ≈ 15 μm consisting of orthogonal microwaveguides with a width of w ≈ 5 μm on the basis of a permalloy
Publikováno v:
Journal of Communications Technology and Electronics. 63:80-86
Effect of argon pressure 0.09 ≤ P ≤ 1 Pa on the microcrystalline structure and magnetic properties of the cobalt films with a thickness of d ≈ 300 nm that are fabricated with the aid of magnetic sputtering on the SiO2/Si substrates is studied.
Autor:
A. S. Dzhumaliev, Yu. V. Nikulin
Publikováno v:
Series Physics. 17:254-262
Autor:
Yu. V. Nikulin, A. S. Dzhumaliev
Publikováno v:
Series Physics. 17:242-253
Publikováno v:
Physics of the Solid State. 58:1247-1256
The influence of the bias voltage polarity Us on microstructure, crystallographic texture and magnetic properties has been investigated for Ni films with a thickness of ≈15–420 nm, which are obtained via magnetron sputtering at a working gas pres
Publikováno v:
Technical Physics. 61:924-928
The effect of the working gas pressure (P ≈ 1.33–0.09 Pa) and the substrate temperature (T s ≈ 77–550 K) on the texture and the microstructure of nickel films deposited by magnetron sputtering onto SiO2/Si substrates is studied. Ni(200) films
Publikováno v:
Physics of the Solid State. 58:1053-1057
The effect of substrate temperature T sub and bias voltage U bias on the texture of NiFe films with thickness d ∼ 30–340 nm deposited by DC magnetron sputtering onto Si(111)/SiO2 substrates under working gas pressure ∼ 0.2 Pa has been investiga