Zobrazeno 1 - 10
of 36
pro vyhledávání: '"A. N. Gentselev"'
Publikováno v:
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques. 14:1403-1409
A new method for manufacturing a stamp or a mold, which differs from well-known LIGA technology, is described. They can be used to mold biochips of various plastics. A typical sequence of operations in LIGA technology is as follows: the formation of
Publikováno v:
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques. 14:862-865
A simple method for manufacturing silicon masks for deep X-ray lithography, conducted with the application of exposure radiation of the spectral range (0.5–7 A), is described. This method is based on planar silicon technology, which is widely used
Autor:
F. N. Dultsev, D. S. Tanygina, B. G. Goldenberg, V. I. Kondratyev, Sergei A. Kuznetsov, A. N. Gentselev, A. G. Zelinsky
Publikováno v:
Optoelectronics, Instrumentation and Data Processing. 55:115-125
A method for fabricating high-pass terahertz quasi-optical filters in the form of thick (up to 1 mm in thickness) self-bearing copper microstructures of subwavelength topology is described. This method is based on forming a high-aspect-ratio mask of
Publikováno v:
Optoelectronics, Instrumentation and Data Processing. 54:127-134
A method of fabrication of thick (~100 μm and more) resistive masks is described. These masks can be used for solving various engineering problems, e.g., for fabricating x-ray-absorbing topological patterns for LIGA masks, stamp microrelief, cast mo
Publikováno v:
Optoelectronics, Instrumentation and Data Processing. 53:88-95
This paper describes a technological approach to the implementation of quasioptical high-pass subterahertz filters with the use of high-aspect pseudometallic structures. The approach is based on micropatterning a solid polymer layer of polymethylmeth
Publikováno v:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 9:53-61
A simple technique for the production of lithography templates (lithography masks) with beryllium support membranes ∼50-100 μm in thickness with different types of masking coating (in the form of metallic layers produced through electroplating or
Publikováno v:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 7:1261-1269
A simple fabrication technology of hard X-ray masks with thin (50–150μm thick) X-ray transparent bearing membranes made of a new material, i.e., polymerized epoxy resin with graphite filler (hereafter, epoxygraphite), is described. The first resul
Publikováno v:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 6:12-18
Differential scanning calorimetry and thermogravimetric analysis results for polymethyl methacrylate (PMMA, monomer with the atomic formula C5H8O2) samples, extensively used as an X-ray resist, are presented. The size distribution of aerosol particle
Autor:
A. N. Gentselev, B. G. Goldenberg, A. G. Zelinskii, V. F. Pindyurin, V. I. Kondrat’ev, S. K. Golubtsov
Publikováno v:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 5:725-729
The first results of using manufactured available graphite foil as a material for supporting membranes in X-ray LIGA masks are presented, and a comparison of them with analogues is carried out.
Autor:
V. V. Lyakh, A. N. Gentselev, Valery F. Pindyurin, E. V. Petrova, V. S. Eliseev, L. A. Mezentseva, V. I. Kondrat’ev, B. G. Goldenberg
Publikováno v:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 1:307-311
We consider a technique for manufacturing LIGA x-ray masks based on direct formation of a deep pattern topology of the mask by an x-ray microbeam. This technique does not require an intermediate mask, which strongly simplifies manufacturing and reduc