Zobrazeno 1 - 10
of 33
pro vyhledávání: '"A. N. Genkin"'
Publikováno v:
Polymer Science Series A. 55:218-224
The effect of the 2′-(3-trifluoromethyl-2,2,3-trifluorocyclobutyl)ethyl radical in fluorosiloxane on the thermodynamics of dissolution of various low-molecular-mass compounds in this polymer is studied via inverse gas chromatography. The activity c
Publikováno v:
Polymer Science Series A. 52:919-929
Samples of ethyl esters of perfluorinated acids based on hexafluoropropene oxide oligomers with molecular masses of 2000, 3100, and 4500 are used as stationary phases, and their interactions with low-molecular-mass compounds (sorbates) of different n
Autor:
V. N. Genkin, Yu. G. Tynnikov
Publikováno v:
Technical Physics Letters. 26:1102-1104
The possible energy contributions to a gas flow, achievable under the blocking conditions, were determined in a quasi-one-dimensional approximation. The features of gas dynamics in flow reactors are considered and the conditions for obtaining various
Publikováno v:
Russian Journal of General Chemistry. 81:783-784
For the successful use of these compounds in the modern membrane, catalytic, and other advanced technologies synthetic methods are required, which allow a consecutive utilization of the reactivity of sulfofluoride and fluorocarbonyl functions. In par
Autor:
Vladimir N. Genkin
Publikováno v:
Advances in Resist Technology and Processing XI.
The chemical amplified resists are a good way of the solution of the X-ray, e-beam and DUV resist sensitivity problem. The difficulties of this way are connected with a high temperature diffusion during the process of the chemical amplification [1] (
Autor:
M. Y. Myl'nikov, Vladimir N. Genkin
Publikováno v:
Advances in Resist Technology and Processing XI.
The development processes in microlithography consist in removing of exposure region with rate V exceeding the dissolution rate of unexposed regions. The technology characteristics of the resists are the contrast, the sensitivity and the resolution.
Autor:
M. Y. Myl'nikov, Vladimir N. Genkin
Publikováno v:
Advances in Resist Technology and Processing X.
In the fabrication of integrated circuits (IC) the solubility dependence of a polymer on its macromolecular length is used. The development process is multistage and involves series thicknesses just as in photo and plasma etching. In lithography this
Autor:
G. P. Bobilkov, Vladimir N. Genkin
Publikováno v:
SPIE Proceedings.
Autor:
V. G. Kurin, A. V. Okomel’kov, Alexander A. Andronov, I. A. Shereshevsky, Vladimir N. Genkin, Mark Ghinovker, I. M. Nefedov
Publikováno v:
SPIE Proceedings.
Dynamic processes in 1D superconducting superlattices (SSLs) with a period substantially higher than the coherence length are investigated theoretically. The dynamic resistive state and the nonlinear response to laser irradiation are studied. The res
Autor:
Vladimir N. Genkin
Publikováno v:
SPIE Proceedings.
Some aspects of photomodification of polymer glasses and their applicability for the tasks of Xray 1ithograph are discussed. 1. Modification of dielectrics in the fields smaller than the atomic ones results from the absorption of'' light which can be