Zobrazeno 1 - 10
of 25
pro vyhledávání: '"A. N. Bykanov"'
Publikováno v:
High Energy Chemistry. 46:271-275
Results of UV spectral measurements in low-pressure (30–65 Pa) and atmospheric-pressure inductively coupled radiofrequency discharges at different power inputs and gas compositions typical for that of industrial processing regimes are reported. Iso
Autor:
William N. Partlo, Georgiy O. Vaschenko, Christopher P. Chrobak, David W. Myers, Oleh V. Khodykin, Alexander N. Bykanov, Alex I. Ershov, Nigel R. Farrar, Norbert R. Bowering, Igor V. Fomenkov, David C. Brandt, Jerzy R. Hoffman
Publikováno v:
Microelectronic Engineering. 86:509-512
This paper describes the development of a LPP EUV source using a CO"2 laser with tin droplet targets. Burst power of 100W and average power of 25W has been achieved. Collector mirrors have been fabricated with >50% reflectivity and show stable EUV im
Autor:
G. N. Shabanova, S. N. Bykanov
Publikováno v:
Refractories and Industrial Ceramics. 43:247-250
Results of a study of the subsolidus structure of the BaO – Al2O3 – Fe2O3 system at 1300°C are presented. Based on thermodynamic and experimental data, the triangulation of the system, previously unreported, is carried out with regard for all ph
Autor:
Victor Hartanto, Kenneth B. Cummings, Robert E. Weiss, Sergei A Sobolevsky, Alexander N Bykanov, Michael Perrotti, Vladimir Egorov
Publikováno v:
Urology. 58:1059-1063
Objectives. To compare the sensitivity and accuracy of the mechanical imaging system (MI system) to that of the simulated digital rectal examination (DRE) in detecting nodules within fabricated rubber prostate phantoms. Mechanical imaging is a new te
Autor:
Michael J. Lercel, Chirag Rajyaguru, Richard L. Sandstrom, Bruno La Fontaine, David W. Myers, Kevin Zhang, Toshi Ishihara, Silvia De Dea, Georgiy O. Vaschenko, Norbert R. Bowering, Robert N. Jacques, Jonathan Grava, Alex I. Ershov, Daniel J. W. Brown, Robert A. Bergstedt, Christian J. Wittak, Imtiaz Ahmad, Michael R. Woolston, Alexander N. Bykanov, Vladimir B. Fleurov, David C. Brandt, Peter I. Porshnev, Alexander Schafgans, Shailendra N. Srivastava, Robert J. Rafac, Rod D. Simmons, Wayne J. Dunstan, Palash P. Das, Igor V. Fomenkov, Peter Baumgart, Yezheng Tao
Publikováno v:
SPIE Proceedings.
Laser produced plasma (LPP) systems have been developed as the primary approach for the EUV scanner light source for optical imaging of circuit features at sub-22nm and beyond nodes on the ITRS roadmap. This paper provides a review of development pro
Autor:
Igor V. Fomenkov, Daniel J. W. Brown, Michael J. Lercel, David W. Myers, Alexander N. Bykanov, Alex I. Ershov, Bruno La Fontaine, David C. Brandt, Norbert R. Bowering
Publikováno v:
SPIE Proceedings.
Through a number of experimental studies carried out on various experimental test stands we are characterizing the scaling of EUV power and collector lifetime. The current performance of the first generation of EUV sources to support EUV lithography
Autor:
David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, David W. Myers, Richard L. Sandstrom, Bruno M. La Fontaine, Michael J. Lercel, Alexander N. Bykanov, Norbert R. Böwering, Georgiy O. Vaschenko, Oleh V. Khodykin, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Palash Das, Vladimir B. Fleurov, Kevin Zhang, Daniel J. Golich, Silvia De Dea, Richard R. Hou, Wayne J. Dunstan, Christian J. Wittak, Peter Baumgart, Toshihiko Ishihara, Rod D. Simmons, Robert N. Jacques, Robert A. Bergstedt
Publikováno v:
SPIE Proceedings.
Autor:
Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, David W. Myers, Daniel Brown, Richard L. Sandstrom, Bruno La Fontaine, Alexander N. Bykanov, Georgiy O. Vaschenko, Oleh V. Khodykin, Norbert R. Böwering, Palash Das, Vladimir B. Fleurov, Kevin Zhang, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Richard R. Hou, Wayne J. Dunstan, Peter Baumgart, Toshihiko Ishihara, Rod D. Simmons, Robert N. Jacques, Robert A. Bergstedt, David C. Brandt
Publikováno v:
SPIE Proceedings.
Autor:
Oleh V. Khodykin, Alex I. Ershov, David W. Myers, Richard R. Hou, Alexander N. Bykanov, Daniel J. Golich, Shailendra N. Srivastava, Silvia De Dea, Imtiaz Ahmad, Richard L. Sandstrom, Georgiy O. Vaschenko, Igor V. Fomenkov, Wayne J. Dunstan, Kevin M. O'brien, Chirag Rajyaguru, Norbert R. Bowering, William N. Partlo, David C. Brandt
Publikováno v:
SPIE Proceedings.
This paper is devoted to the development of laser produced plasma (LPP) EUV source architecture for advanced lithography applications in high volume manufacturing of integrated circuits. The paper describes the development status of subsystems most c
Autor:
David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, David W. Myers, Richard L. Sandstrom, Norbert R. Böwering, Georgiy O. Vaschenko, Oleh V. Khodykin, Alexander N. Bykanov, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel J. Golich, Silvia De Dea, Richard R. Hou, Kevin M. O'Brien, Wayne J. Dunstan
Publikováno v:
SPIE Proceedings.