Zobrazeno 1 - 10
of 90
pro vyhledávání: '"A. Mitwalsky"'
Autor:
Mitwalsky, Maximilian
Um den Einsatz von Faserverbundwerkstoffen in der Automobilindustrie zu ermöglichen, werden hochautomatisierte und materialdurchsatzstarke Fertigungsprozesse benötigt. Zwar erfüllt der Flechtprozess diese Anforderungen, allerdings führt dessen de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______518::3663c9ee90530aad954c0549d4dad024
https://mediatum.ub.tum.de/doc/1244755/document.pdf
https://mediatum.ub.tum.de/doc/1244755/document.pdf
Publikováno v:
Journal of Applied Physics; 5/15/1993, Vol. 73 Issue 10, p4942, 9p
Publikováno v:
Journal of Applied Physics; 7/15/1991, Vol. 70 Issue 2, p708, 12p, 6 Black and White Photographs, 1 Diagram, 1 Chart, 11 Graphs
Publikováno v:
Journal of Applied Physics; 7/15/1991, Vol. 70 Issue 2, p693, 15p, 5 Black and White Photographs, 2 Charts, 16 Graphs
Autor:
A. Mitwalsky, W. Kern, David Arthur Bohling, H. Treichel, K. R. Coyle, Andrew P. Lane, G. Tempel, B.S. Felker, N. P. Sandler, M.A. George, G. Zorn
Publikováno v:
Advanced Materials for Optics and Electronics. 5:163-175
Flims of metal oxides, such as Ta2O5, Nb2O5, Al2O3, HfO2, ZrO2 and TiO2 have been fabricated by use of different precursor materials, deposition techniques and annealing techniques. Several analytical methods were applied to study the layers. New dat
Publikováno v:
Ultramicroscopy. 52:127-140
Special preparation techniques have to be applied for trans-mission electron microscope (TEM) failure analysis of ULSI devices as well as for technology characterization of non-periodic test patterns to obtain information from volumes as small as 1
Publikováno v:
Journal of Applied Physics. 73:4942-4950
Ion‐beam‐sputtered and electron‐beam‐evaporated Co/Au multilayers have been investigated with high‐resolution transmission electron microscopy. The multilayers are found to exhibit a strong {111} texture and to contain Co predominantly in t
Publikováno v:
ChemInform. 22
Autor:
K. R. Coyle, G. Zorn, D. A. Bohling, B. S. Felker, W. Kern, H. Treichel, A. P. Lane, G. Tempel, M. George, A. Mitwalsky, N. P. Sandler
Publikováno v:
ChemInform. 26
Publikováno v:
Advanced Materials for Optics and Electronics. 1:299-308
A laminar flow low-pressure chemical vapour deposition (LPCVD) system (LAM IntegrityTM) has been used to deposit tantalum pentoxide (Ta2O5) from Ta(OEt)5 films in the presence of oxygen (O2) at 470 °C at a typical deposition rate of 4 nm min−1. Un