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pro vyhledávání: '"A. M. Rymyantsev"'
Autor:
M. Yu. Maximov, A. O. Silin, A. M. Rymyantsev, P. A. Novikov, Denis Nazarov, Yongguang Zhang, Anatoly Popovich
Publikováno v:
Journal of Electronic Materials. 46:6571-6577
In this study, thin films of tin dioxide have been synthesized on substrates of silicon and stainless steel by atomic layer deposition (ALD) with tetraethyl tin and by inductively coupled remote oxygen plasma as precursors. Studies of the surface mor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::016e2b7dd4df7b575cabe9746c7502a8
https://doi.org/10.1007/s11664-017-5701-8
https://doi.org/10.1007/s11664-017-5701-8
