Výsledky vyhledávání - "A. M. Belmahi"

Preliminary Synthesis of Carbon Nitride Thin Films by N$_2$/CH$_4$ Microwave Plasma Assisted Chemical Vapour Deposition: Characterisation of the Discharge and the Obtained Films

Autor: Henri N. Migeon, M. Belmahi, Virginie Hody, Badreddine Assouar, Valerie Brien, Paul Kouakou, Jamal Bougdira

Publikováno v: Plasma Processes and Polymers
Plasma Processes and Polymers, Wiley-VCH Verlag, 2007, 4 (S1), pp.S210-S214. ⟨10.1002/ppap.200730703⟩

International audience; The present work deals with the synthesis of crystalline carbon nitride thin films by microwave plasma assisted chemical vapour deposition in N2/CH4 gas mixture. The discharge analysis by optical emission spectroscopy shows th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::603b9680d1df0ab33a9fc8e710c68f30

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Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition

Autor: P. Yoboué, M. Belmahi, Bafetigue Ouattara, Jamal Bougdira, Paul Kouakou

Publikováno v: Journal of Applied Sciences. 17:306-314

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::610aca0fd69f2b3418e983a728ed5ef4
https://doi.org/10.3923/jas.2017.306.314

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Optimizing the sputter deposition process of polymers for the Storing Matter technique using PMMA

Autor: Patrick Philipp, Kai Nordlund, Canan Turgut, Godhuli Sinha, M. Belmahi, Jouko Lahtinen

Publikováno v: Journal of Mass Spectrometry. 51:889-899

Quantitative analyses in secondary ion mass spectrometry (SIMS) become possible only if ionization processes are controlled. The Storing Matter technique has been developed to circumvent this so-called matrix effect, primarily for inorganic samples,

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::2ede3c68fc9e215b150c473975b832c3
https://doi.org/10.1002/jms.3797

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Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering

Autor: Angélique Bousquet, Guillaume Monier, Hussein Mehdi, Christine Robert-Goumet, Luc Thomas, A. Bachar, Eric Tomasella, Antoine Goullet, M. Belmahi, Thierry Sauvage

Publikováno v: Applied Surface Science
Applied Surface Science, Elsevier, 2018, 444, pp.293-302. ⟨10.1016/j.apsusc.2018.03.040⟩
Applied Surface Science, 2018, 444, pp.293-302. ⟨10.1016/j.apsusc.2018.03.040⟩

International audience; Radiofrequency reactive magnetron sputtering was used to deposit hydrogenated amorphous silicon carbonitride (a-SiCxNy:H) at 400 °C by sputtering a silicon target under CH4 and N2 reactive gas mixture. Rutherford backscatteri

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d7fcc14a856df9591659a40ad105a00d
https://hal.archives-ouvertes.fr/hal-01774950

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Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2 /N2 /Ar/Hexamethyldisilazane Gas Mixture

Autor: M. Belmahi, Laurent Le Brizoual, Amanda Thouvenin, R. Hugon, Patrice Miska, Jamal Bougdira, Ludovic de Poucques, Damien Genève, Jean-Luc Vasseur, Simon Bulou

Publikováno v: Plasma Processes and Polymers. 11:551-558

SiCxNy:H thin films are obtained with the microwave plasma assisted chemical vapour deposition (MPACVD) method in the gas mixture H2/Ar/Hexamethyldisilazane. When very few amounts of nitrogen are added to the gas mixture, the film composition changes

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::388ae74c51ea85f7378cf5c18f964d99
https://doi.org/10.1002/ppap.201300166

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Wide variations of SiCxNy:H thin films optical constants deposited by H2/N2/Ar/hexamethyldisilazane microwave plasma

Autor: Laurent Le Brizoual, Patrice Miska, M. Belmahi, Ludovic de Poucques, Jamal Bougdira, Simon Bulou

Publikováno v: Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 2012, 208, pp.46-50. ⟨10.1016/j.surfcoat.2012.07.079⟩
Surface and Coatings Technology, 2012, 208, pp.46-50. ⟨10.1016/j.surfcoat.2012.07.079⟩

SiC x N y :H thin film growth has been achieved in N 2 /H 2 /Ar/hexamethyldisilazane microwave plasma induced chemical vapor deposition process. Depending on the N 2 and H 2 flow rates, film composition can be changed from “SiC x :H-like” to “S

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::702ea8648f829a4d2436da0e342e4214
https://doi.org/10.1016/j.surfcoat.2012.07.079

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Fragmentation of polystyrene during sputter deposition in the storing matter instrument

Autor: Canan Turgut, Tom Wirtz, M. Belmahi, Patrick Philipp

Publikováno v: Surface and Interface Analysis. 46:357-359

The storing matter technique has been developed to get easier quantification in secondary ion mass spectrometry (SIMS) by decoupling the sputtering step from the analysis step. First, the matter is deposited in the submonolayer range on a collector t

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3e4b4cc43758251bd0f90a5ec4f4de94
https://doi.org/10.1002/sia.5649

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Cadmium sulfide thin films growth by chemical bath deposition

Autor: Hervé Rinnert, M. Belmahi, M.S. Aida, Jamal Bougdira, D. Genève, Ghouti Medjahdi, N. Attaf, S. Hariech

Publikováno v: Journal of Semiconductors. 39:034004

Cadmium sulfide (CdS) thin films have been prepared by a simple technique such as chemical bath deposition (CBD). A set of samples CdS were deposited on glass substrates by varying the bath temperature from 55 to 75 °C at fixed deposition time (25 m

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::855887a2c8482cd592e278d47f2a6ccc
https://doi.org/10.1088/1674-4926/39/3/034004

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Thermal and Optical Properties of CdS Nanoparticles in Thermotropic Liquid Crystal Monomers

Autor: Issam Ahmed Mohammed, Marc Alnot, Mohamed Badreddine Assouar, M. Belmahi, Hervé Rinnert, Hooi Ling Lee

Publikováno v: Materials
Materials, Vol 3, Iss 3, Pp 2069-2086 (2010)
Materials; Volume 3; Issue 3; Pages: 2069-2086

Two new mesogenic monomers, namely 3,3’-dimethoxy-4,4’-di(hydroxyhexoxy)-N-benzylidene-o-Tolidine (Ia) and 4,4’-di(6-hydroxyhexoxy)-N-benzylidene-o-Tolidine (IIa), were reacted with cadmium sulfide (CdS) via an in situ chemical precipitation me

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2ddeaf09e411a1cd258c013b908f48fe
http://europepmc.org/articles/PMC5445895

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Characterization of a N2 /CH4 Microwave Plasma With a Solid Additive Si Source Used for SiCN Deposition

Autor: Ludovic de Poucques, Henri-Noël Migeon, M. Belmahi, R. Hugon, Laurent Le Brizoual, Jamal Bougdira, Simon Bulou

Publikováno v: Plasma Processes and Polymers. 6:S576-S581

Microwave plasma assisted chemical vapour deposition of CH4/N2 gas mixture using an additive solid silicon is used to synthesize SiCN. To better understand the mechanisms involved, species such as C, Si, NH, CN, C2 and N2 are observed by means of opt

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b3073de37e750180fb55d74c6cb7d7e3
https://doi.org/10.1002/ppap.200931404

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