Zobrazeno 1 - 10
of 14
pro vyhledávání: '"A. K. Sinelnichenko"'
Autor:
V. I. Ivashchenko, A. A. Onoprienko, P. L. Skrynskyy, A. K. Sinelnichenko, A. M. Kovalchenko, E. I. Olifan, O. K. Marchuk
Publikováno v:
Journal of Superhard Materials. 44:405-412
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::87895a4d2b50b86411aa959121132768
https://doi.org/10.3103/s1063457622060053
https://doi.org/10.3103/s1063457622060053
Autor:
A. O. Kozak, V.S. Manzhara, O. K. Sinelnichenko, L.A. Ivashchenko, R.V. Shevchenko, V.I. Ivashchenko, O. K. Porada
Publikováno v:
International Journal of Hydrogen Energy. 47:7263-7273
The structure, chemical bonding and photoemission of amorphous hydrogenated silicon carbonitride (a-SiCN:H) films deposited by plasma-enhanced chemical vapor deposition (PECVD) using hexamethyldisilazane as a main precursor at different hydrogen flow
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::23b8b83268d7166cf5af53d003d2bce7
https://doi.org/10.1016/j.ijhydene.2021.01.090
https://doi.org/10.1016/j.ijhydene.2021.01.090
Autor:
O. K. Marchuk, A. K. Sinelnichenko, A. O. Kozak, Volodymyr Ivashchenko, P. M. Lytvyn, A.A. Onoprienko, P. L. Skrynskyy, E. I. Olifan
Publikováno v:
Journal of Superhard Materials. 43:100-110
—The Ti–Al–C and Ti–Al–Si–C films have been deposited on Si(100) substrates by dual DC magnetron sputtering of the Ti–Al composite, graphite, and SiC targets at various sputtering currents. The effects of the sputtering current and anne
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f0e39fe2259d37a6d061f8830b1d0a72
https://doi.org/10.3103/s1063457621020064
https://doi.org/10.3103/s1063457621020064
Autor:
A. V. Sukach, O. K. Sinelnichenko, A. O. Kozak, V. V. Tetyorkin, O. I. Olifan, V. B. Muratov, Volodymyr Ivashchenko, P.L. Scrynskyy
Publikováno v:
Journal of Superhard Materials. 42:311-322
The structural, mechanical, and electrophysical properties of Al–B, Al–B–C, and Al–B–Si–C coatings obtained by dual magnetron sputtering of AlB2, SiC, and graphite targets are studied. During deposition, the current applied to the AlB2-co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f26297157205ce1a873ca1b38f59ed0e
https://doi.org/10.3103/s1063457620050184
https://doi.org/10.3103/s1063457620050184
Autor:
A. A. Kozak, P.L. Scrynskyy, Volodymyr Ivashchenko, A. K. Sinelnichenko, E. I. Olifan, A. M. Kovalchenko, A.A. Onoprienko
Publikováno v:
Journal of Superhard Materials. 42:68-77
Using the direct current reaction magnetron sputtering technique, Cr–Ni–B–C–N films are deposited onto silicon substrates by sputtering Cr–Ni and B–C targets in an Ar/N2 gas mixture. The microstructure, chemical bonds, hardness, and tribo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f39e4e4ad3b93706c07f00efbfe790a
https://doi.org/10.3103/s1063457620020069
https://doi.org/10.3103/s1063457620020069
Publikováno v:
Journal of Superhard Materials. 41:90-97
The effect of the gas mixture composition on the structure, chemical bond character and hardness of Si-B-C-N films was systematically studied. A series of Si-B-C-N films was deposited by reactive dc magnetron sputtering of the target composed of Si d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a6ccc5c889e687030bbbbedc14f6080e
https://doi.org/10.3103/s1063457619020035
https://doi.org/10.3103/s1063457619020035
Autor:
A.A. Onoprienko, M. Tapajna, Volodymyr Ivashchenko, E. I. Olifan, P.L. Scrynskyy, L. Orovčík, A. K. Sinelnichenko, A. M. Kovalchenko, A. O. Kozak
Publikováno v:
Thin Solid Films. 730:138723
The films in Ti-B-C system have been deposited onto Si (100) substrates by dual direct current magnetron sputtering of Ti-B and graphite targets. During deposition, the sputtering parameters at the Ti-B target were unchanged, and the carbon content i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::891d06eff973eb318a2568e0dac0fa53
https://doi.org/10.1016/j.tsf.2021.138723
https://doi.org/10.1016/j.tsf.2021.138723
Autor:
O. O. Butenko, A. O. Kozak, P.L. Scrynskyy, Sergey Dub, O. K. Sinelnichenko, Volodymyr Ivashchenko
Publikováno v:
Thin Solid Films. 599:72-77
The Al―Mg―B films were deposited on silicon substrates by direct current magnetron sputtering from the AlMgB 14 target at low discharge power and at substrate temperature ranging from 100 to 500 °C. The deposited films have been annealed at 1000
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3191273cbd02311bf530962cdcf615e5
https://doi.org/10.1016/j.tsf.2015.12.059
https://doi.org/10.1016/j.tsf.2015.12.059
Autor:
A. O. Kozak, Volodymyr Ivashchenko, Sergey Dub, G. N. Tolmacheva, O. K. Sinelnichenko, I. I. Tymofeeva, O. S. Lytvyn, O. K. Porada, L. A. Ivashchenko
Publikováno v:
Journal of Superhard Materials. 37:300-309
The Si-C-N thin films have been deposited onto silicon substrates by reactive direct current magnetron sputtering of a silicon–carbon target at different ratios of nitrogen, ${F_{{N_2}}}$ , and argon, F Ar, flows rates. The X-ray diffraction, IR sp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44056736a389f237f3602d96623a099b
https://doi.org/10.3103/s1063457615050020
https://doi.org/10.3103/s1063457615050020
Autor:
O. O. Butenko, Frances C. Hill, Volodymyr Ivashchenko, O. S. Lytvyn, P.L. Scrynskyy, Jerzy Leszczynski, O. K. Sinelnichenko, Leonid Gorb, A. O. Kozak
Publikováno v:
Journal of Superhard Materials. 36:381-392
NbN and Nb-Si-N films have been deposited by magnetron sputtering of the Nb and Si targets on silicon wafers at various powers supplied to the Nb target. The films have been investigated by an atomic force microscope, X-ray diffraction, X-ray photoel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3bdf60a27dc25e2073e793ac8df491ad
https://doi.org/10.3103/s1063457614060033
https://doi.org/10.3103/s1063457614060033