Zobrazeno 1 - 10
of 19
pro vyhledávání: '"A. K. Omaev"'
Publikováno v:
Optics and Spectroscopy. 130:203-206
Publikováno v:
Technical Physics Letters. 44:1142-1144
High-quality heteroepitaxial (0001)ZnO:Te/(0001)GaN/(0001)Al2O3 structures have been grown by hydrogen vapor-phase epitaxy in a low-pressure continuous flow reactor. X-ray diffraction analysis of these heterostructures has been carried out, which rev
Publikováno v:
Technical Physics. 59:708-710
The electrical and luminescent properties of zinc oxide films grown by CVD on sapphire substrates with different carrier gases are investigated. It is found that hydrogen, oxygen, and ammonia used as a carrier gas in the growth process insignificantl
Autor:
B. M. Ataev, G. A. Onushkin, S. Sh. Makhmudov, Ya. I. Alivov, V. V. Mamedov, E.V. Kalinina, A. K. Omaev
Publikováno v:
Journal of Crystal Growth. 275:e2471-e2474
We report on the first results of n-ZnO/p-SiC heterostructures fabrication by chemical vapor deposition in the low-pressure system. The structural and luminescence properties of these structures are studied.
Publikováno v:
Technical Physics Letters. 36:34-36
Arrays of zinc oxide (ZnO) nanowhskers oriented perpendicularly to the surface of a substrate have been obtained by explosive laser evaporation of ZnO target on (0001)-oriented sapphire and unoriented silica, glass ceramic composite (Polycor), and gl
Publikováno v:
Inorganic Materials. 36:219-222
High-conductivity, transparent zinc oxide epilayers doped with In and Ga (0.1–2 wt %) were grown by chemical vapor transport in a reduced-pressure flow reactor. Their electrical and optical properties were studied.
Publikováno v:
Materials Science and Engineering: B. 65:159-163
It is possible to fabricate thin epitaxial ZnO layers doped in situ with In and Ga impurities by chemical vapor deposition (CVD) in a low-pressure system. Highly conductive and transparent ZnO:Me (0.1–2 wt.%) films are deposited on (1012) sapphire
Publikováno v:
Journal of Crystal Growth. :1222-1225
Sucessful preparation of ZnO : M epitaxial thin films (ETF) in situ doped with donor impurity M=Ga, Sn by chemical vapor despsition in a low-pressure system is reported. Highly conductive (up to 10 −4 Ω cm) and transparent ( T >85%) ZnO : M ETF ha
Publikováno v:
Bulletin of the Russian Academy of Sciences: Physics. 71:657-659
n-ZnO/p-A IIIN (A III = Ga, Al) heterojunctions have been fabricated, which exhibit relatively strong electroluminescence in the blue-violet spectral range under forward bias. It is shown that ZnO layers grown with rf-discharge activation have a less
Autor:
Darren M. Bagnall, David C. Look, M. V. Chukichev, A. E. Cherenkov, E. V. Kalinina, B. M. Ataev, A. K. Omaev, Ya. I. Alivov
Publikováno v:
Applied Physics Letters. 83:4719-4721
We report on the fabrication of n-ZnO/p-AlGaN heterojunction light-emitting diodes on 6H-SiC substrates. Hydride vapor phase epitaxy was used to grow p-type AlGaN, while chemical vapor deposition was used to produce the n-type ZnO layers. Diode-like,