Zobrazeno 1 - 10
of 26
pro vyhledávání: '"A. Houadef"'
Autor:
Houadef, Ali, Djezzar, Boualem
Publikováno v:
In Microelectronics Reliability September 2022 136
Autor:
Houadef, Ali1 (AUTHOR) a.houadef@univ-boumerdes.dz, Djezzar, Boualem2 (AUTHOR)
Publikováno v:
International Journal of RF & Microwave Computer-Aided Engineering. Oct2021, Vol. 31 Issue 10, p1-12. 12p.
Earthworm effect on invertebrate community under Olive tree ecosystem in Semi-arid Region of Algeria
Publikováno v:
Polish Journal of Entomology. 91:11-22
The biodiversity of the invertebrate community in the soil is greatly influenced by the presence of earthworms, which are also influenced by variations in the physicochemical and biological characteristics of the soil as well as the climate and the e
Autor:
Boualem Djezzar, Ali HOUADEF
Publikováno v:
Algerian Journal of Signals and Systems. 6:16-23
Hot carrier stress is evaluated on a laterally diffused MOSFET (LDMOS) by TCAD simulation. The device under test is obtained from process simulation under a 1µm CMOS flow available at CDTA. The n-type transistor uses the LOCOS (local oxidation of si
Autor:
Boualem Djezzar, Ali HOUADEF
Publikováno v:
ICCEIS 2021.
Autor:
Boualem Djezzar, Ali HOUADEF
Publikováno v:
ICCEIS 2021.
Autor:
A. Houadef, Boualem Djezzar
Publikováno v:
2021 IEEE 32nd International Conference on Microelectronics (MIEL).
This work investigates by TCAD simulation the impact of hot carrier degradation (HCD) in an nLDMOS that uses many topological features. The trenched gate and the triple-RESURF used to optimally reduce the device on-resistance $(R_{ON})$ , triggers DC
Autor:
Ali Houadef, Boualem Djezzar
Publikováno v:
International Journal of RF and Microwave Computer-Aided Engineering. 31
Autor:
Ali Houadef, Boualem Djezzar
Publikováno v:
Microelectronics Reliability. 136:114636
Autor:
Boualem Djezzar, Ali Houadef
Publikováno v:
2020 International Conference on Electrical Engineering (ICEE).
Physically based device simulation of hot carrier injection (HCI) degradation is performed. The device under test is a LOCOS (local oxidation of silicon) based, single RESURF (reduced surface field), LDMOS (laterally diffused MOSFET). The transistor