Zobrazeno 1 - 10
of 14
pro vyhledávání: '"A. H. Brader"'
Autor:
A. H. Brader, L. V. Owens
Publikováno v:
Surgical endoscopy. 9(5)
Laparoscopic abdominal surgery has opened many previously unexploited diagnostic and therapeutic options. At our institution, we have used laparoscopic techniques in several patients to successfully salvage dysfunctional Tenckhoff catheters. Peritone
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::79c01ff155dc40de2d50500d7ebd1a81
https://pubmed.ncbi.nlm.nih.gov/7676375
https://pubmed.ncbi.nlm.nih.gov/7676375
Publikováno v:
Dry Etching for VLSI ISBN: 9781489925688
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3634840ea138c0210fa38b90844f26b
https://doi.org/10.1007/978-1-4899-2566-4_1
https://doi.org/10.1007/978-1-4899-2566-4_1
Publikováno v:
Dry Etching for VLSI ISBN: 9781489925688
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::86062ee480371da0e50b298483ed1241
https://doi.org/10.1007/978-1-4899-2566-4_5
https://doi.org/10.1007/978-1-4899-2566-4_5
Publikováno v:
Dry Etching for VLSI ISBN: 9781489925688
The ac discharge introduced in the previous chapter consists, apart from the parent gas, of a multitude of neutral and positively or negatively charged, ground-state, excited and fragmented particles. These species are generated mostly by collision p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0bb9b0086520f8782bf031fe01077c4f
https://doi.org/10.1007/978-1-4899-2566-4_4
https://doi.org/10.1007/978-1-4899-2566-4_4
Publikováno v:
Dry Etching for VLSI ISBN: 9781489925688
An enormous amount of data and information on plasmas has been gathered up till now. How has all this information been obtained? This point is not only of academic interest, but measurement of plasma properties instead of reading machine settings red
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7758aa3cba2800546ab15bc6c177dba
https://doi.org/10.1007/978-1-4899-2566-4_7
https://doi.org/10.1007/978-1-4899-2566-4_7
Publikováno v:
Dry Etching for VLSI ISBN: 9781489925688
Current dry etching systems use glow discharges with gas pressures ranging typically from 0.5 to 500 Pa. Electrical power supply is by ac only, with frequencies of 50 kHz and up. High-frequency excitation is applied as it takes out the necessity to d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aefb112488e5d0368e254f68a5ad2543
https://doi.org/10.1007/978-1-4899-2566-4_3
https://doi.org/10.1007/978-1-4899-2566-4_3
Publikováno v:
Dry Etching for VLSI ISBN: 9781489925688
The term “plasma”, in relation to the low-pressure ionized gas in dry etching reactors, has already been introduced casually in chapter 1. Plasmas can be considered as the fourth state of existence, together with solid, liquid and gas. It is a co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b6c5502c8d283a8f9bf306253b689c7
https://doi.org/10.1007/978-1-4899-2566-4_2
https://doi.org/10.1007/978-1-4899-2566-4_2
Publikováno v:
Dry Etching for VLSI ISBN: 9781489925688
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed3ddff437a668afd7205280ac650e2e
https://doi.org/10.1007/978-1-4899-2566-4_6
https://doi.org/10.1007/978-1-4899-2566-4_6
Autor:
ALAN H. BRADER
Publikováno v:
The Journal of Trauma: Injury, Infection, and Critical Care. 30:1420
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::09dfa229d2e0595e2d7d5f8f1057cc4d
https://doi.org/10.1097/00005373-199011000-00026
https://doi.org/10.1097/00005373-199011000-00026