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pro vyhledávání: '"A. Gzregorzyck"'
Publikováno v:
In Journal of Crystal Growth 2008 310(17):3957-3963
Publikováno v:
Journal of Crystal Growth, 310, 17, pp. 3957-3963
Journal of Crystal Growth, 310, 3957-3963
Journal of Crystal Growth, 310, 3957-3963
GaN layers of various thicknesses (40-350 μm) were grown by hydride vapor-phase epitaxy (HVPE) on sapphire substrates and on the metal-organic chemical vapor deposition (MOCVD) grown GaN/Al 2 O 3 templates. The quality of the grown layers on these t