Zobrazeno 1 - 3
of 3
pro vyhledávání: '"A. G. Radosel'sky"'
Autor:
A. G. Radosel'sky, J. W. Metselaar, V. D. Chernomordic, A. A. Sherchenkov, D Stryahilev, A. A. Popov, B. G. Budaguan, Andrei Sazonov
Publikováno v:
Journal of The Electrochemical Society. 145:2508-2512
In this work, a-Si:H films with good electronic properties in spite of an inhomogeneous structure were prepared by the 55 kHz plasma enhanced chemical vapor high-rate deposition technique. The structural analysis using infrared spectroscopy and atomi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bb3677af5e0792da331f2502627aba25
https://doi.org/10.1149/1.1838669
https://doi.org/10.1149/1.1838669
Publikováno v:
MRS Proceedings. 485
The perspectives for solar cell application of structural inhomogeneous a-Si:H films deposited at high growth rates (∼10–20 Å/s) from 100% SiH4 in low frequency (LF) 55kHz glow discharge plasma have been investigated. In this case the influence
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ab805babf5b6f957c675b456577be5ff
https://doi.org/10.1557/proc-485-297
https://doi.org/10.1557/proc-485-297
Publikováno v:
MRS Proceedings. 467
It has been reported in previous works that using of RF 55 kHz PECVD method allows to deposit microstructural inhomogeneous a-Si:H films at high deposition rate (10–20Å/c) and with high photoconductivity The structural analysis with using of IR sp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::73af28a78a9212aa729375113ffe1f3f
https://doi.org/10.1557/proc-467-239
https://doi.org/10.1557/proc-467-239