Zobrazeno 1 - 3
of 3
pro vyhledávání: '"A V Aghabekyan"'
Autor:
V. R. Shayapov, M. Yu. Afonin, M. V. Katkov, M. S. Lebedev, A. V. Aghabekyan, I. V. Yushina, D. E. Petukhova, G. Y. Ayvazyan, E. A. Maksimovskii
Publikováno v:
Journal of Contemporary Physics (Armenian Academy of Sciences). 56:240-246
The results of experimental studies of the anti-reflection properties of black silicon (b-Si) layers coated with thin films of TiO2, HfO2, and Sc2O3 metal oxides by atomic layer deposition (ALD) are presented. An improvement in the antireflection pro
Publikováno v:
2021 IEEE 32nd International Conference on Microelectronics (MIEL).
This paper reports the investigation on the passivation properties of the hafnium dioxide (Hf02) film deposited on n-type black silicon (b-Si) surface via atomic layer deposition (ALD) method. It is shown that in addition to efficient passivation, Hf
Publikováno v:
Proceedings of the International Scientific and Practical Conference on Education, Health and Human Wellbeing (ICEDER 2019).