Zobrazeno 1 - 6
of 6
pro vyhledávání: '"A S Zubrilov"'
Autor:
Vyacheslav A. Elyukhin, Mark Holtz, A. S. Zubrilov, Vladimir Dmitriev, S. N. G. Chu, Henryk Temkin, V. G. Antipov, Irina P. Nikitina, Luis Grave de Peralta, N. N. Faleev, S. Francoeur, Andrei Nikolaev, T. Prokofyeva, G. A. Seryogin, Yuriy Melnik, Sergey A. Nikishin
Publikováno v:
MRS Internet Journal of Nitride Semiconductor Research. 5:467-473
We describe the growth of high quality AlN and GaN on Si(111) by gas source molecular beam epitaxy (GSMBE) with ammonia (NH3). The initial nucleation (at 1130−1190K) of an AlN monolayer with full substrate coverage resulted in a very rapid transiti
Autor:
E.V. Kalinina, G.F. Kholujanov, D. Tsvetkov, V.A. Soloviev, A. S. Zubrilov, V.D. Tretjakov, Vladimir A. Dmitriev, Hua-Shuang Kong, M.P. Vatnik
Publikováno v:
Materials Science and Engineering: B. 46:259-262
Electrical and luminescent characteristics of epitaxial 4H-SiC p-n junctions, both prior and after ion doping (ID) with Al, were studied. The implantation of Al ions was performed in the top p-layer of the epitaxial p-n structures. It was found that
Autor:
L. Grave de Peralta, K. Choi, G. Kipshidze, Yu. Kudryavtsev, Rene Asomoza, Sergey A. Nikishin, Henryk Temkin, Vladimir Kuryatkov, A. S. Zubrilov, Mark Holtz, T. Prokofyeva, Iu. Gherasoiu
Publikováno v:
Scopus-Elsevier
We report the results of epitaxial growth experiments on AlxGa1−xN (0≤ x ≤ 1) on Si(111) and sapphire substrates aimed at understanding the origin and elimination of cracking. We describe growth procedures resulting in thick layers of AlxGa1−
Autor:
G. Kipshidze, Yu. Kudryavtsev, Kisik Choi, Rene Asomoza, Mark Holtz, Iu. Gherasoiu, V. Tretyakov, Vladimir Kuryatkov, A. S. Zubrilov, T. Prokofyeva, Sergey A. Nikishin, Henryk Temkin, K. Copeland, L. Grave de Peralta
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19:1409
Layers of AlxGa1−xN, with 0⩽x⩽1, were grown on Si(111) substrates by gas source molecular beam epitaxy with ammonia. We show that the initial formation of the Si–N–Al interlayer between the Si substrate and the AlN layer, at a growth temper
Autor:
V V Voronenkov, A A Leonidov, N I Bochkareva, R I Gorbunov, P E Latyshev, Y S Lelikov, V S Kogotkov, A S Zubrilov, Y G Shreter
Publikováno v:
Journal of Physics: Conference Series; 2019, Vol. 1199 Issue 1, p1-1, 1p
Autor:
Irina P. Nikitina, V. G. Antipov, Sergey A. Nikishin, T. Prokofyeva, S. N. G. Chu, Vyacheslav A. Elyukhin, Yuriy Melnik, Mark Holtz, S. Francoeur, G. A. Seryogin, N. N. Faleev, Henryk Temkin, Vladimir Dmitriev, Luis Grave de Peralta, A. S. Zubrilov, Andrei Nikolaev
Publikováno v:
Scopus-Elsevier
ResearcherID
ResearcherID
We describe the growth of high quality AlN and GaN on Si(111) by gas source molecular beam epitaxy (GSMBE) with ammonia (NH3). The initial nucleation (at 1130-1190K) of an AlN monolayer with full substrate coverage resulted in a very rapid transition
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