Zobrazeno 1 - 10
of 26
pro vyhledávání: '"A M Engwall"'
Publikováno v:
Fusion Science and Technology. :1-18
Autor:
J. B. Legradi, C. Di Paolo, M. H. S. Kraak, H. G. van der Geest, E. L. Schymanski, A. J. Williams, M. M. L. Dingemans, R. Massei, W. Brack, X. Cousin, M.-L. Begout, R. van der Oost, A. Carion, V. Suarez-Ulloa, F. Silvestre, B. I. Escher, M. Engwall, G. Nilén, S. H. Keiter, D. Pollet, P. Waldmann, C. Kienle, I. Werner, A.-C. Haigis, D. Knapen, L. Vergauwen, M. Spehr, W. Schulz, W. Busch, D. Leuthold, S. Scholz, C. M. vom Berg, N. Basu, C. A. Murphy, A. Lampert, J. Kuckelkorn, T. Grummt, H. Hollert
Publikováno v:
Environmental Sciences Europe, Vol 30, Iss 1, Pp 1-34 (2018)
Abstract The numbers of potential neurotoxicants in the environment are raising and pose a great risk for humans and the environment. Currently neurotoxicity assessment is mostly performed to predict and prevent harm to human populations. Despite all
Externí odkaz:
https://doaj.org/article/ed52b9cfdd544b70a24f6cfac55fd331
Autor:
Swanee J. Shin, Leonardus B. Bayu Aji, Alison M. Engwall, John H. Bae, Gregory V. Taylor, Paul B. Mirkarimi, Chantel Aracne-Ruddle, Jack Nguyen, Casey W. N. Kong, Sergei O. Kucheyev
Boron carbide is an attractive ablator for next-generation inertial confinement fusion (ICF) targets. Here we describe several aspects of our ongoing systematic studies of the deposition and processing of B4C coatings for ICF targets. We show that re
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5578da633a2c580ba5cc8c37b9f6ce78
Autor:
Alexander A. Baker, Alison M. Engwall, Leonardus Bimo Bayu-Aji, John H. Bae, Swanee J. Shin, John D. Moody, Sergei O. Kucheyev
Publikováno v:
Coatings; Volume 12; Issue 7; Pages: 917
Tantalum-based films with tailored composition, density, and electrical resistivity are of interest for next generation hohlraums for magnetized indirect-drive inertial confinement fusion. Here, we use reactive direct-current magnetron sputtering to
Autor:
L. B. Bayu Aji, S. J. Shin, J. H. Bae, A. M. Engwall, J. A. Hammons, S. T. Sen-Britain, P. B. Mirkarimi, S. O. Kucheyev
Publikováno v:
Journal of Vacuum Science & Technology A. 41:023407
The deposition of thick B[Formula: see text]C films with low residual stress by conventional direct-current magnetron sputtering is accompanied by the formation of dust particulates contaminating the target, chamber, and substrates and leading to the
Autor:
A. Alijagic, N. Scherbak, O. Kotlyar, P. Karlsson, A. Persson, A. Hedbrant, U. Norinder, M. Larsson, J. Felth, L. Andersson, E. Särndahl, M. Engwall
Publikováno v:
Toxicology Letters. 368:S226-S227
Publikováno v:
Surface and Coatings Technology. 363:191-197
Tungsten films (750–1200 nm thick) deposited by high-power impulse magnetron sputtering (HiPIMS) under various sputtering gas pressure and substrate bias are investigated for their physical and microstructural characteristics. Compared to films dep
Autor:
L B Bayu Aji, A M Engwall, S J Shin, J H Bae, A A Baker, D J Strozzi, S K McCall, J D Moody, S O Kucheyev
Publikováno v:
Journal of Physics D: Applied Physics. 55:485302
Gold-bismuth alloys are of interest as catalysts and catalytic sensing systems, electrochemical sensors, superconductors, and hohlraums for magnetically assisted inertial confinement fusion implosions. Radiation-hydrodynamics simulations with the Las
Autor:
S. J. Shin, L. B. Bayu Aji, A. M. Engwall, J. H. Bae, A. A. Baker, J. D. Moody, S. O. Kucheyev
Publikováno v:
Applied Physics Letters. 121:141903
Heavy-metal-based films with high electrical resistivity are needed for hohlraums for magnetically assisted inertial confinement fusion. Here, we study ternary Au–Ta–O films deposited by reactive direct-current magnetron co-sputtering from elemen
Publikováno v:
Journal of Applied Mechanics. 87
We report closed-form formulas to calculate the incremental-deposition stress, the elastic relaxation stress, and the residual stress in a finite-thickness film from a wafer-curvature measurement. The calculation shows how the incremental deposition