Fabrication of spectrally sharp Si-based dielectric resonators: combining etaloning with Mie resonances

Autor: D. Toliopoulos, 1, 2 M. Khoury, 1 M. Bouabdellaoui, 1 N. Granchi, 3 J.-B. Claude, 4 A. Benali, 1 I. Berbezier, 1 D. Hannani, 1 A. Ronda, 1 J. Wenger, 4 M. Bollani, 5 M. Gurioli, 1 S. Sanguinetti, 2, 5 F. Intonti, 3, M. Abbarchi1

Publikováno v: Optics Express
Optics Express, Optical Society of America-OSA Publishing, 2020, 28 (25), pp.37734. ⟨10.1364/OE.409001⟩
Optics express (2020). doi:10.1364/OE.409001
info:cnr-pdr/source/autori:D. Toliopoulos,1,2 M. Khoury,1 M. Bouabdellaoui,1 N. Granchi,3 J.-B. Claude,1,4 A. Benali,1 I. Berbezier,1 D. Hannani,1 A. Ronda,1 J. Wenger,4 M. Bollani,5 M. Gurioli,1 S. Sanguinetti,2,5 F. Intonti,3 and M. Abbarchi1/titolo:Fabrication of spectrally sharp Si-based dielectric resonators: Combining etaloning with Mie resonances/doi:10.1364%2FOE.409001/rivista:Optics express/anno:2020/pagina_da:/pagina_a:/intervallo_pagine:/volume
Optics Express, 2020, 28 (25), pp.37734. ⟨10.1364/OE.409001⟩

We use low-resolution optical lithography joined with solid state dewetting of crystalline, ultra-thin silicon on insulator (c-UT-SOI) to form monocrystalline, atomically smooth, silicon-based Mie resonators in well-controlled large periodic arrays.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::79af1e1ae52ebfe644bf1bf202cc43bd
http://hdl.handle.net/20.500.12278/27398