Studies on atomic layer deposition of MOF-5 thin films

Autor: David Grosso, Timo Sajavaara, Leo D. Salmi, Mikko Heikkilä, Esa Puukilainen, Mikko Ritala

Publikováno v: Microporous and Mesoporous Materials
Microporous and Mesoporous Materials, 2013, 182, pp.147-154. ⟨10.1016/j.micromeso.2013.08.024⟩
Microporous and Mesoporous Materials, Elsevier, 2013, 182, pp.147-154. ⟨10.1016/j.micromeso.2013.08.024⟩

International audience; Deposition of MOF-5 thin films from vapor phase by atomic layer deposition (ALD) was studied at 225-350 degrees C. Zinc acetate (ZnAc2) and 1,4-benzenedicarboxylic acid (1,4-BDC) were used as the precursors. The resulting film

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7158a3ed79afb3cd64134e4e16bb1d44
https://hal.science/hal-01289765