Zobrazeno 1 - 10
of 59 354
pro vyhledávání: '"0038-1101"'
Publikováno v:
Solid-State Electronics
DOI: 10.1016/j.sse.2017.08.006 URL: https://www-sciencedirect-com.sabidi.urv.cat/science/article/pii/S0038110117303908?via%3Dihub Filiació URV: SI Source-to-drain (SD) tunneling decreases the device performance in MOSFETs falling below the 10 nm cha
Publikováno v:
Solid-State Electronics
Filiació URV: SI DOI: 10.1016/j.sse.2017.02.004 URL: http://www.sciencedirect.com/science/article/pii/S0038110117301077 Memòria In this paper we provide solutions to update a long channel model in order to take into account the short channel effect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::24077fa3dc59bae3850aebcfebac1430
http://hdl.handle.net/20.500.11797/PC2599
http://hdl.handle.net/20.500.11797/PC2599
Autor:
Alejandra Castro-Carranza, Oana Moldovan, Slobodan Miljakovic, Benjamin Iniguez, Antonio Cerdeira, Rodrigo Martins, Elvira Fortunato, Magali Estrada, Pedro Barquinha
Publikováno v:
Solid-State Electronics
Repositori Institucional de la Universitat Rovira i Virgili
Universitat Rovira i virgili (URV)
Repositori Institucional de la Universitat Rovira i Virgili
Universitat Rovira i virgili (URV)
DOI: 10.1016/j.sse.2016.09.011 URL: http://www.sciencedirect.com/science/article/pii/S003811011630140X Filiació URV: SI Inclòs a la memòria: SI An advanced compact and analytical drain current model for the amorphous gallium indium zinc oxide (GIZ
Autor:
Pérez, Santiago S.1 (AUTHOR), Bedoya, Alessandro1 (AUTHOR), Prócel, Luis Miguel1 (AUTHOR), Taco, Ramiro1 (AUTHOR) ramiro.taco@dimes.unical.it
Publikováno v:
International Journal of Applied Electromagnetics & Mechanics. 2023, Vol. 73 Issue 1, p15-24. 10p.
Publikováno v:
Solid-State Electronics
Repositori Institucional de la Universitat Rovira i Virgili
Universitat Rovira i virgili (URV)
Repositori Institucional de la Universitat Rovira i Virgili
Universitat Rovira i virgili (URV)
DOI: 10.1016/j.sse.2017.08.006 URL: https://www-sciencedirect-com.sabidi.urv.cat/science/article/pii/S0038110117303908?via%3Dihub Filiació URV: SI Source-to-drain (SD) tunneling decreases the device performance in MOSFETs falling below the 10 nm cha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=RECOLECTA___::91a983ccff38d6ec07cd8c3d030a1e1d
http://hdl.handle.net/20.500.11797/PC3098
http://hdl.handle.net/20.500.11797/PC3098
Publikováno v:
Solid-State Electronics
Repositori Institucional de la Universitat Rovira i Virgili
Universitat Rovira i virgili (URV)
Repositori Institucional de la Universitat Rovira i Virgili
Universitat Rovira i virgili (URV)
Filiació URV: SI DOI: 10.1016/j.sse.2017.02.004 URL: http://www.sciencedirect.com/science/article/pii/S0038110117301077 Memòria In this paper we provide solutions to update a long channel model in order to take into account the short channel effect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=RECOLECTA___::8607c2345c9d8e479293692457719e69
http://hdl.handle.net/20.500.11797/PC2599
http://hdl.handle.net/20.500.11797/PC2599
Autor:
Panda, Sridhar, Parida, Rajat Subhra, Dora, G Chiranjibi, Swain, Raghunandan, Panigrahy, Asisa Kumar, Aduri, Kishore Reddy, Suresh, M.
Publikováno v:
Transactions on Electrical & Electronic Materials; Oct2024, Vol. 25 Issue 5, p600-607, 8p
Autor:
Radha, S.1 (AUTHOR) radhaphd13@gmail.com, Shylu, D.S.1 (AUTHOR), Nagabushanam, P.2 (AUTHOR) nagabushanamphd14@gmail.com, Mathew, Jisha1 (AUTHOR)
Publikováno v:
Journal of High Speed Networks. 2019, Vol. 25 Issue 2, p181-203. 23p.
Publikováno v:
Annals of the University Dunarea de Jos of Galati: Fascicle XIV, Mechanical Engineering / Analele Universităţii "Dunărea de Jos" din Galaţi. Fascicula XIV, Inginerie Mecanică. 2011, Issue 2, p1-182. 182p. 1 Chart.
Publikováno v:
Annals of the University Dunarea de Jos of Galati: Fascicle XIV, Mechanical Engineering / Analele Universităţii "Dunărea de Jos" din Galaţi. Fascicula XIV, Inginerie Mecanică. 2011, Issue 1, p1-182. 182p. 1 Chart.