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Publikováno v:
Journal of Atomic & Molecular Physics (1000-0364); Jun2024, Vol. 41 Issue 3, p1-8, 8p
Autor:
Han-Bin Chen, 陳漢賓
95
Co-doped with Al and F ZnO transparent conductive film were deposited on Corning glass and Si substrates by RF magnetron sputtering process. The effects of impurities concentration, sputtering power, sputtering time and substrate temperature
Co-doped with Al and F ZnO transparent conductive film were deposited on Corning glass and Si substrates by RF magnetron sputtering process. The effects of impurities concentration, sputtering power, sputtering time and substrate temperature
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/93358360119296534899
