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pro vyhledávání: '"鄭逸立"'
Autor:
Yi-Li Cheng, 鄭逸立
96
In this study, supercritical fluids (SCF) technology is employed originally to effectively improve the properties of low-temperature-deposited silicon oxide dielectric films. In this work, 7 nm ultra-thin Silicon Oxide (SiOx) films are fabric
In this study, supercritical fluids (SCF) technology is employed originally to effectively improve the properties of low-temperature-deposited silicon oxide dielectric films. In this work, 7 nm ultra-thin Silicon Oxide (SiOx) films are fabric
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/21304037870626443541
