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pro vyhledávání: '"鄭招仁"'
Autor:
chaojen cheng, 鄭招仁
87
Silane is an important gas used for CVD process in semiconductor industries, but the flue gas contain unreactive gases which are treated by burner directly. Silane may cause spontaneous ignition in atmosphere, and the product silicon dioxide
Silane is an important gas used for CVD process in semiconductor industries, but the flue gas contain unreactive gases which are treated by burner directly. Silane may cause spontaneous ignition in atmosphere, and the product silicon dioxide
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/17187847879943692625
