Zobrazeno 1 - 5
of 5
pro vyhledávání: '"郑云友 Zheng Yun-you"'
Autor:
肖 洋 XIAO Yang, 周 鹏 ZHOU Peng, 闫润宝 YAN Run-bao, 郑云友 ZHENG Yun-you, 齐勤瑞 QI Qin-rui, 魏崇喜 WEI Chong-xi, 章 旭 ZHANG Ran, 张 然 ZHANG Xu
Publikováno v:
Chinese Journal of Liquid Crystals and Displays. 32:269-274
TFT-LCD面板在屏幕上有斑点或波浪状Mura，影响液晶显示器的品质，经过图形匹配，缺陷与曝光机机台形貌匹配。通过对异常区域特性分析，发现异常区域的BMCD、BM像素间距存在异常。对原因
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64f1fd4941b538db0c6a183882b2307b
https://doi.org/10.3788/yjyxs20173204.0269
https://doi.org/10.3788/yjyxs20173204.0269
Autor:
郑云友 Zheng Yun-you, 李升玄 Li Sheng-xuan, 邵喜斌 Shao Xi-bin, 刘 杰 Liu Jie, 郭会斌 Guo Hui-bin, 贠向南 Yun Xiang-nan, 袁剑峰 Yuan Jian-feng, 郭总杰 Guo Zong-jie, 王守坤 Wang Shou-kun
Publikováno v:
Chinese Journal of Liquid Crystals and Displays. 30:801-806
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a82ea9e51e9569ec71f60c476a6d9be2
https://doi.org/10.3788/yjyxs20153005.0801
https://doi.org/10.3788/yjyxs20153005.0801
Autor:
李正勳 Li Zheng-xun, 张光明 Zhang Guang-ming, 刘杰 Liu Jie, 宋泳珍 Song Yong-zhen, 徐守宇 Xu Shou-yu, 吴成龙 Wu Cheng-long, 李伟 Li Wei, 曲泓铭 Qu Hong-ming, 郑云友 Zheng Yun-you
Publikováno v:
Chinese Journal of Liquid Crystals and Displays. 28:224-227
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9ff0b4c52a2e5712640f33a531c8ca77
https://doi.org/10.3788/yjyxs20132802.0224
https://doi.org/10.3788/yjyxs20132802.0224
Autor:
姚立红 Yao Li-hong, 张定涛 Zhang Ding-tao, 李伟 Song Yong-zhen, 宋泳珍 Li Wei, 郑云友 Zheng Yun-you, 张光明 Zhang Guang-ming, 袁明 Yuan Ming, 李文彬 Li Wen-bin
Publikováno v:
Chinese Journal of Liquid Crystals and Displays. 28:860-867
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::409dea61007c1421e71f676b6d173a62
https://doi.org/10.3788/yjyxs20132806.0860
https://doi.org/10.3788/yjyxs20132806.0860
Autor:
李伟 Li Wei, 吴成龙 Wu Cheng-long, 王文青 Wang Wen-qing, 王亮 Wang Liang, 宋泳珍 Song Yong-zhen, 李鑫 Li Xin, 李正勳 Li Zheng-xun, 郑云友 Zheng Yun-you
Publikováno v:
Chinese Journal of Liquid Crystals and Displays. 27:204-207
The effects on the PR ashing rate,uniformity and H/V ratio were researched in process of ECCP dry etch model when the gas flow rate and pressure changed.The results show that PR ashing rate and the value of H/V would enlarge with the increasing press
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e3674eee5fd24cc8abe555b25f14d2bb
https://doi.org/10.3788/yjyxs20122702.0204
https://doi.org/10.3788/yjyxs20122702.0204