Zobrazeno 1 - 10
of 10
pro vyhledávání: '"赵 正予"'
Publikováno v:
Kongjian kexue xuebao, Vol 43, Pp 456-465 (2023)
在夜间电离层，气辉135.6 nm谱线主要由F层的O+和电子的辐射复合过程以及O+和O–的中性复合过程激发，该谱线强度和电离层峰值电子密度NmF2存在很强的相关性。利用夜气辉135.6 nm辐射强度与F2
Externí odkaz:
https://doaj.org/article/fe8e84f013bb46bfa09154b4dab4c454
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China Sciencepaper; 2017, Vol. 12 Issue 3, p354-360, 7p
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Science Technology & Engineering. 2024, Vol. 24 Issue 6, p2213-2221. 9p.
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Journal of Jiangsu University (Natural Science Edition) / Jiangsu Daxue Xuebao (Ziran Kexue Ban). Nov2016, Vol. 37 Issue 6, p675-683. 5p.
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Journal of Jiangsu University (Natural Science Edition) / Jiangsu Daxue Xuebao (Ziran Kexue Ban). Nov2016, Vol. 37 Issue 6, p679-683. 5p.
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Computer Measurement & Control; 2018, Vol. 26 Issue 3, p280-284, 5p
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Plasma Science & Technology; Dec2018, Vol. 20 Issue 12, p1-1, 1p
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Plasma Science & Technology; Nov2018, Vol. 20 Issue 11, p1-1, 1p