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pro vyhledávání: '"許兼貴"'
Autor:
CHIEN-KUI HSU, 許兼貴
89
There are two major parts in this thesis. One is establishing the anti-reflective coatings technique for using in deep ultraviolet photomask. The other is to investigate the behavior of DUV photoresists for applying in electron beam direct wr
There are two major parts in this thesis. One is establishing the anti-reflective coatings technique for using in deep ultraviolet photomask. The other is to investigate the behavior of DUV photoresists for applying in electron beam direct wr
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/01628748885775596799
